Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Daniel J. Colon"'
Autor:
Koji Toyoda, Harry J. Levinson, Ivan Lalovic, German E. Rylov, Alden Acheta, Eric Kent, Daniel J. Colon, Kazuhiro Takahashi, Nigel R. Farrar
Publikováno v:
Optical Microlithography XVIII.
In this work, we demonstrate a resolution enhancement technique for DUV lithography in which the light source spectrum is modified in order to improve the imaging performance of given device patterns. With this technique, termed RELAX, the imaging de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::339605b77a4fbb7fa74b896237ee586c
https://doi.org/10.1117/12.601002
https://doi.org/10.1117/12.601002
Autor:
Herve A. Besaucele, Robert J. Rafac, Vladimir B. Fleurov, Toshihiko Ishihara, Alexei Lukashev, Daniel J. W. Brown, Paolo Zambon, Daniel J. Colon, Patrick O'Keeffe, Alexander I. Ershov, Fedor B. Trintchouk
Publikováno v:
SPIE Proceedings.
Since the announcement in March 2002 of plans to develop an advanced light source to meet the future spectral power and cost requirements of photolithography, we have made significant progress in the development and productization of the core technol
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a2fb26427341a3fb5d9e5a77fda6ac85
https://doi.org/10.1117/12.485358
https://doi.org/10.1117/12.485358