Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Daniel H. Malueg"'
Publikováno v:
SPIE Proceedings.
The CNTech Advanced Lithography Toolset uses a beam propagation method to calculate the intensity profile as it propagates through the mask and into the photoresist. One can construct the membrane, absorber, gap, and resist, each as a series of n-sli
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54235e6f47b0afdde44d861397828fdf
https://doi.org/10.1117/12.535422
https://doi.org/10.1117/12.535422
Autor:
Michael J. Trybendis, K. Myers, Yuansheng Ma, M. Yu, Q. Leonard, Henry I. Smith, James Taylor, Brent Boerger, Daniel H. Malueg, E. Moon, J. Wallace, Scott Dhuey, Francesco Cerrina, R. Selzer
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 23:2896
We show the first results from a newly-operation advanced x-ray stepper, and describe an improved type of x-ray mask for use on it. The Mod 5C is the newest x-ray stepper developed by JMAR (JSAL Nanolithography). It is configured for installation at
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::48097cee673bca5201a8f62b895f0a52
https://doi.org/10.1116/1.2121711
https://doi.org/10.1116/1.2121711
Publikováno v:
Japanese Journal of Applied Physics. 43:3722
This paper presents a powerful modeling approach to the X-ray exposure operating space of a silicon nitride clear phase-shifter mask to produce sub-50 nm features. By first developing a central composite experimental design, we then used a wavefront
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4285d686d67757084ba764432899cad6
https://doi.org/10.1143/jjap.43.3722
https://doi.org/10.1143/jjap.43.3722
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22:3575
Phase-shifting masks are widely used in optical lithography, and the question is whether the technology can be extended to much shorter wavelengths. We have extensively modeled the use of clear phase-mask materials as absorbers for x-ray exposures. S
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a3a43a3437f08a7c0739214ca242931f
https://doi.org/10.1116/1.1809626
https://doi.org/10.1116/1.1809626
Publikováno v:
Inorganic Chemistry. 20:3540-3543
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::50bea61e621a4b9022ccc671eb2ac5f1
https://doi.org/10.1021/ic50224a076
https://doi.org/10.1021/ic50224a076