Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Daniel E. Geist"'
Autor:
D.I. Proskurovsky, Trevor F. Page, V. P. Rotshtein, John J. Vajo, Anthony J. Perry, J Taylor, A. B. Markov, Robert E. Doty, Steve Bull, Jesse N. Matossian, Daniel E. Geist, PC Rice-Evans
Publikováno v:
Metallurgical and Materials Transactions A. 30:2931-2939
Monolithic TiN coatings deposited onto cemented carbide cutting tool inserts coated by chemical vapor deposition (CVD) or physical vapor deposition (PVD) methods, respectively, were subjected to pulsed intense electron beam treatments in the energy r
Autor:
P.C. Rice-Evans, Trevor F. Page, John J. Vajo, Steve Bull, Robert E. Doty, James Taylor, V. P. Rotshtein, Anthony J. Perry, Dmitri I. Proskurovsky, A. B. Markov, Jesse N. Matossian, Daniel E. Geist
Publikováno v:
Surface and Coatings Technology. :337-342
Monolithic TiN coatings deposited onto cemented carbide cutting tool inserts coated by PVD methods have been subjected to pulsed intense electron beam treatments in the energy range 3–5 J cm −2 . The temperature profiles for this rapid thermal pr
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:1848-1853
The present work is concerned with microstructural changes brought about by ion implantation into TiN as-deposited by classical chemical vapor deposition onto cemented carbide substrates. After implantation the ions occupy an implanted zone (IZ) exte
Publikováno v:
Surface and Coatings Technology. :225-229
The residual stress in cemented carbide, specifically in the WC phase, following PVD and CVD coating processes is studied together with the effects of ion implantation post-treatment of the CVD-coated material. Over the depth range studied, the compr
Profiling the residual stress and integral strain distribution in yttrium implanted titanium nitride
Autor:
Anthony J. Perry, Daniel E. Geist
Publikováno v:
Vacuum. 48:833-838
The residual stress in ceramic materials is affected by ion implantation down to depths well below the zone where the implant resides, e.g. the implantation of TiN with NiTi dual or nitrogen ions has been shown to reduce the residual stress down t
Autor:
Daniel E. Geist, Natalya V Girsova, Eduard V Kozlov, Alexei S Tailashev, Alexander I. Ryabchikov, Yurii P. Sharkeev, Anthony J. Perry
Publikováno v:
Thin Solid Films. :393-398
It is well known that after ion implantation, microstructural changes are found at depths well beyond the range of the implanted ions. In the present work samples of a disordered Ni3Fe alloy, implanted with four doses of a multicomponent ion beam (wh
Autor:
Anthony J. Perry, Daniel E. Geist
Publikováno v:
Surface and Coatings Technology. :309-314
The effect of implantation with the large, heavy ion, yttrium into TiN is measured over the depth range 0.1–2.6 μm. The results confirm the earlier work: a compressive stress is developed in the implanted zone accompanied by a wide distribution of
Autor:
S. Prasad Boppana, Theo Z. Kattamis, Kevin Schlichting, Geoff Dearnaley, Deepak G. Bhat, James R. Treglio, Anthony J. Perry, Daniel E. Geist
Publikováno v:
Key Engineering Materials. :177-194
Publikováno v:
Surface and Coatings Technology. 89:62-69
The X-ray diffraction pattern of κ-Al 2 O 3 in the form of a coating over a Ti(C,N) interlayer has been indexed up to the 204 peak in terms of the hexagonal super-lattice of the orthorhombic unit cell. The lattice parameters have been derived using
Publikováno v:
Surface and Coatings Technology. :364-371
The residual stress and strain distribution in each phase of as-ground cemented carbide, before and after metal ion implantation, has been studied using parallel beam glancing angle X-ray diffraction down to a maximum depth of penetration of about 1