Zobrazeno 1 - 10
of 159
pro vyhledávání: '"Dan Herr"'
Publikováno v:
APL Materials, Vol 1, Iss 4, Pp 040701-040701 (2013)
Recent discussions concerning the continuation of Moore's law have focused on announcements by several major corporations to transition from traditional 2D planar to new 3D multi-gate field effect transistor devices. However, the growth and progressi
Externí odkaz:
https://doaj.org/article/db5470e2dd0044c7be42e943d66ed964
Autor:
Robert M, Kotloff, Sandralee, Blosser, Gerard J, Fulda, Darren, Malinoski, Vivek N, Ahya, Luis, Angel, Matthew C, Byrnes, Michael A, DeVita, Thomas E, Grissom, Scott D, Halpern, Thomas A, Nakagawa, Peter G, Stock, Debra L, Sudan, Kenneth E, Wood, Sergio J, Anillo, Thomas P, Bleck, Elling E, Eidbo, Richard A, Fowler, Alexandra K, Glazier, Cynthia, Gries, Richard, Hasz, Dan, Herr, Akhtar, Khan, David, Landsberg, Daniel J, Lebovitz, Deborah Jo, Levine, Mudit, Mathur, Priyumvada, Naik, Claus U, Niemann, David R, Nunley, Kevin J, O'Connor, Shawn J, Pelletier, Omar, Rahman, Dinesh, Ranjan, Ali, Salim, Robert G, Sawyer, Teresa, Shafer, David, Sonneti, Peter, Spiro, Maryam, Valapour, Deepak, Vikraman-Sushama, Timothy P M, Whelan, Kevin, O'Connor
Publikováno v:
Critical care medicine. 43(6)
This document was developed through the collaborative efforts of the Society of Critical Care Medicine, the American College of Chest Physicians, and the Association of Organ Procurement Organizations. Under the auspices of these societies, a multidi
Autor:
Amal Chabli, Peter Cherns, Nicolas Chevalier, David Cooper, Dominique Lafond, François Bertin, Henri Blanc, Ariel Brenac, Philippe Andreucci, Jean-Christophe Gabriel, Erik M. Secula, David G. Seiler, Rajinder P. Khosla, Dan Herr, C. Michael Garner, Robert McDonald, Alain C. Diebold
Publikováno v:
Frontiers of Characterization and Metrology for Nanoelectronics. AIP, 2009
2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics
2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics, May 2009, Albany, New York, United States. pp.12-20, ⟨10.1063/1.3251207⟩
ResearcherID
2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics
2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics, May 2009, Albany, New York, United States. pp.12-20, ⟨10.1063/1.3251207⟩
ResearcherID
International audience; Depending on the level of the technological developments, the characterization techniques are mature tosupport them or still require protocol definition and relevance demonstration for the issues addressed. For BeyondCMOS and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::56834d9add8aebf5479754f426c6258f
https://hal-cea.archives-ouvertes.fr/cea-01549318/file/47-Chabli_caract-3d_Chabli_et_al.pdf
https://hal-cea.archives-ouvertes.fr/cea-01549318/file/47-Chabli_caract-3d_Chabli_et_al.pdf
Autor:
Peter Moeck, Sergei Rouvimov, Edgar F. Rauch, Stavros Nicolopoulos, Erik M. Secula, David G. Seiler, Rajinder P. Khosla, Dan Herr, C. Michael Garner, Robert McDonald, Alain C. Diebold
Publikováno v:
AIP Conference Proceedings.
An automated technique for the mapping of nanocrystal phases and orientations in a transmission electron microscope (TEM) is described. It is based on the projected reciprocal lattice geometry that is extracted from electron diffraction spot patterns
Autor:
B. Beckhoff, P. Hoenicke, D. Giubertoni, G. Pepponi, M. Bersani, Erik M. Secula, David G. Seiler, Rajinder P. Khosla, Dan Herr, C. Michael Garner, Robert McDonald, Alain C. Diebold
Publikováno v:
AIP Conference Proceedings.
Grazing Incidence X‐Ray Fluorescence (GIXRF) analysis in the soft X‐ray range provides excellent conditions for exciting B‐K and As‐Liii,ii shells. The X‐ray Standing Wave field (XSW) associated with GIXRF on flat samples is used as a tunab
Effects of Experimental Parameters on the Work Function Measurement: A Kelvin Force Microscopy Study
Autor:
K. Kaja, N. Chevalier, D. Mariolle, F. Bertin, G. Feuillet, A. Chabli, Erik M. Secula, David G. Seiler, Rajinder P. Khosla, Dan Herr, C. Michael Garner, Robert McDonald, Alain C. Diebold
Publikováno v:
AIP Conference Proceedings.
The analysis of the Work Function measurements, of different materials, using the Kelvin Force Microscopy technique (KFM) is not trivial. Various artifacts can alter the interpretation of KFM results. Thus a good understanding of experimental conditi
Autor:
C. Licitra, R. Bouyssou, T. Chevolleau, N. Rochat, F. Bertin, Erik M. Secula, David G. Seiler, Rajinder P. Khosla, Dan Herr, C. Michael Garner, Robert McDonald, Alain C. Diebold
Publikováno v:
AIP Conference Proceedings.
Porous ultra low‐κ (ULK) dielectrics are used to reduce resistance‐capacitance delay for advanced CMOS interconnects. Since the porosity leads to an increased sensitivity of the material to cleaning, etching and ashing plasmas, new characterizat
Autor:
C. M. Settens, V. K. Kamineni, G. A. Antonelli, A. Grill, A. C. Diebold, R. J. Matyi, Erik M. Secula, David G. Seiler, Rajinder P. Khosla, Dan Herr, C. Michael Garner, Robert McDonald, Alain C. Diebold
Publikováno v:
AIP Conference Proceedings.
X‐ray scattering is a non‐destructive analytical technique capable of detecting electron density fluctuations in mesoporous and nanoporous structures. X‐ray methods have the potential to provide fully quantitative porosity analyses of open and
Autor:
Heiko Stegmann, Yvonne Ritz, Dirk Utess, René Hübner, Ehrenfried Zschech, Erik M. Secula, David G. Seiler, Rajinder P. Khosla, Dan Herr, C. Michael Garner, Robert McDonald, Alain C. Diebold
Publikováno v:
AIP Conference Proceedings.
Sample preparation is a critical step in transmission electron microscopy (TEM) that significantly determines the quality of structural characterization and analysis of a specimen. In recent years, the accuracy and quality requirements for the prepar
Autor:
W. Osten, V. Ferreras Paz, K. Frenner, T. Schuster, H. Bloess, Erik M. Secula, David G. Seiler, Rajinder P. Khosla, Dan Herr, C. Michael Garner, Robert McDonald, Alain C. Diebold
Publikováno v:
AIP Conference Proceedings.
In recent years, scatterometry has become one of the most commonly used methods for CD metrology. With decreasing structure size for future technology nodes, the search for optimized scatterometry measurement configurations gets more important to exp