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pro vyhledávání: '"Dan Cochran"'
Autor:
Ram Peltinov, Bryan J. Rice, Benjamin Bunday, Maayan Bar-Zvi, Emil Piscani, Dan Cochran, John A. Allgair, Aaron Cordes, Ofer Adan, Ndubuisi G. Orji, Yohanan Avitan, Jeff D. Byers
Publikováno v:
SPIE Proceedings.
For many years, lithographic resolution has been the main obstacle for keeping the pace of transistor densification to meet Moore's Law. For the 45 nm node and beyond, new lithography techniques are being considered, including immersion ArF lithograp
Autor:
Kirk Arnett, Dan Cochran
Publikováno v:
Journal of Physical Education, Recreation & Dance. 58:86-88