Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Dan Abrams"'
Autor:
Mark Cook, Michael Murphy, Kristian Bulluss, Wendyl D'Souza, Chris Plummer, Emma Priest, Catherine Williams, Ashwini Sharan, Robert Fisher, Sharon Pincus, Eric Distad, Tom Anchordoquy, Dan Abrams
Publikováno v:
EClinicalMedicine, Vol 22, Iss , Pp - (2020)
Background: A clinical feasibility study was undertaken at a single center of long-term intra-cerebroventricular drug delivery of the anti-seizure medication valproic acid, into the cerebrospinal fluid (CSF) in order to treat drug resistant focal sei
Externí odkaz:
https://doaj.org/article/e18505252e5942b6af7e71dcecd70ad4
Autor:
Catherine Williams, Emma Priest, Robert S. Fisher, Dan Abrams, Kristian J Bulluss, Ashwini Sharan, Eric Distad, Sharon Pincus, Wendyl D'Souza, Mark J. Cook, Chris Plummer, Michael Murphy, Tom Anchordoquy
Publikováno v:
EClinicalMedicine
EClinicalMedicine, Vol 22, Iss, Pp-(2020)
EClinicalMedicine, Vol 22, Iss, Pp-(2020)
Background A clinical feasibility study was undertaken at a single center of long-term intra-cerebroventricular drug delivery of the anti-seizure medication valproic acid, into the cerebrospinal fluid (CSF) in order to treat drug resistant focal seiz
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::968e561e9c857d04d3fef9b0c4999073
https://doi.org/10.1016/j.eclinm.2020.100326
https://doi.org/10.1016/j.eclinm.2020.100326
Autor:
Dan Abrams, David Fisher
The award-winning, New York Times–bestselling chronicle of the sensational murder trial that would be the capstone of Lincoln's legal career.In the summer of 1859, twenty-two-year-old “Peachy” Quinn Harrison went on trial for murder in Springfi
Autor:
Dan Abrams
Ladies and gentlemen of the jury, everyone is familiar with the tired clichés: women are bad drivers and are not good with money; only guys play video games and they give bad directions. Dan Abrams tackles the toughest case of his career in Man Down
Publikováno v:
SPIE Proceedings.
In this paper, we present the Luminescent's ILT approach that can rapidly solve for the optimal photomask design. We will discuss the latest development of ILT at Luminescent in the areas of sub-resolution assist feature (SRAF) generation and optimiz
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::35039a983f2a84de760c6a325638a9d2
https://doi.org/10.1117/12.754568
https://doi.org/10.1117/12.754568
Publikováno v:
SPIE Proceedings.
In this paper, we present the Luminescent's ILT approach that can rapidly solve for the optimal photomask design. We will discuss the latest development of ILT at Luminescent in the areas of sub-resolution assist feature (SRAF) generation, process-wi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f9c6b480f20730981076652fac0fd5b3
https://doi.org/10.1117/12.729028
https://doi.org/10.1117/12.729028
Publikováno v:
SPIE Proceedings.
Inverse Lithography Technology (ILT) is a rigorous approach to determine the mask shapes that produce the desired on-wafer results. In this paper, we briefly describe an image (or pixel))-based implementation of ILT in comparison to OPC technologies,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dae07e21600b1b4c7d14cf39c848aba6
https://doi.org/10.1117/12.681857
https://doi.org/10.1117/12.681857
Publikováno v:
SPIE Proceedings.
This paper presents ILT masks written by a DUV laser writer and a VSB e-beam writer, and their corresponding wafer print results. ILT mathematically determine the mask features that produce the desired on-wafer results. ILT-generated masks sometimes
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f3150b6dcd54deedd503c201fa49af3
https://doi.org/10.1117/12.632738
https://doi.org/10.1117/12.632738
Publikováno v:
SPIE Proceedings.
In this paper we present unintuitive patterns generated by inverse lithography technology. We show examples of contact hole masks designed with ILT that enjoy larger process windows than OPC. We also show variations in ILT-generated masks as the pitc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::02612497a69a88d9d64532a6d6791407
https://doi.org/10.1117/12.632366
https://doi.org/10.1117/12.632366