Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Damon Tsai"'
Autor:
Damon Tsai, Jeffrey Mileham, Sean Lee, Frida Liang, M T Lee, Maddux Chen, David M. Owen, T H Chen
Publikováno v:
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
As chip makers move to advanced nodes and device geometries shrink, design and production costs have risen rapidly. As a result, it has become increasingly critical to reduce costs in established technology nodes by increasing device yield. For a giv
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::08ad6505bbb7044d5554d213ddee0be6
https://doi.org/10.1109/asmc.2017.7969193
https://doi.org/10.1109/asmc.2017.7969193
Autor:
Sean Lee, Jeffrey Mileham, C. F. Hua, Sungtae Kim, Ming Sheng Wei, Eric Bouche, Damon Tsai, Frida Liang, Albert Huang
Publikováno v:
SPIE Proceedings.
As device shrink, there are many difficulties with process integration and device yield. Lithography process control is expected to be a major challenge due to tighter overlay and focus control requirement. The understanding and control of stresses a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::26818b3474bd970d9eb4c4f660514058
https://doi.org/10.1117/12.2257799
https://doi.org/10.1117/12.2257799