Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Damien Djian"'
Autor:
Cristina Borràs-Novell, Mario García Causapié, Maria Murcia, Damien Djian, Óscar García-Algar
Publikováno v:
International journal of bioprinting. 8(2)
Non-invasive masks are designed based on generic facial models; therefore, difficulties in fitting patients’ unique characteristics are common. A poor fit of the mask may have consequences such as air leaks or pressure ulcers. It is possible to opt
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d967f6336cd5d3bc8b7a8ff95d3f7b3a
https://pubmed.ncbi.nlm.nih.gov/35669323
https://pubmed.ncbi.nlm.nih.gov/35669323
Publikováno v:
Journal of Power Sources
Journal of Power Sources, Elsevier, 2009, 187 (2), pp. 575-580. ⟨10.1016/j.jpowsour.2008.11.027⟩
Journal of Power Sources, Elsevier, 2009, 187 (2), pp. 575-580. ⟨10.1016/j.jpowsour.2008.11.027⟩
International audience; The performance of PVdF macroporous separators used in lithium battery at high charge rates was evaluated using Li4Ti5O12 and LiMn2O4 as negative and positive electrodes respectively. The effects of the non-solvent used, the P
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::19306839425b957a27d2e9fea73be89e
https://doi.org/10.1016/j.jpowsour.2008.11.027
https://doi.org/10.1016/j.jpowsour.2008.11.027
Publikováno v:
Journal of Power Sources
Journal of Power Sources, Elsevier, 2007, 172 (1), pp. 416-421. ⟨10.1016/j.jpowsour.2007.07.018⟩
Journal of Power Sources, Elsevier, 2007, 172 (1), pp. 416-421. ⟨10.1016/j.jpowsour.2007.07.018⟩
International audience; The performance of commercial separators at high charge rates was evaluated using Li4Ti5O12 and LiMn2O4 as negative and positive electrodes, respectively. Most of the porous separators tested induced a sharp decrease in the co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::371a77a233d90151fcf69c920f2f3436
https://hal.archives-ouvertes.fr/hal-00386372
https://hal.archives-ouvertes.fr/hal-00386372
Autor:
Harun H. Solak, Elias A. Couladouros, Dimitra Niakoula, Veroniki P. Vidali, Panagiotis Argitis, Cyril Vannuffel, Damien Djian, Serge Tedesco
Publikováno v:
SPIE Proceedings.
Molecular resist have potential interest for low CDs and LERs required in future lithography technology. The lithographic ability of one of them is exposed in this study, by e-beam and by EUV-IL. Work on process condition is described and leads to de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f668b2b4d4bb012441cd32364b207396
https://doi.org/10.1117/12.714263
https://doi.org/10.1117/12.714263