Magnetic field induced localization in a two-dimensional superconducting wire network

Autor: Abilio, C. C., Butaud, P., Fournier, Th., Vidal, J., Tedesco, S., Dalzotto, B., Pannetier, B.

Publikováno v: Phys. Rev. Lett. 83, 5102 (1999)

We report transport measurements on superconducting wire networks which provide the first experimental evidence of a new localization phenomenon induced by magnetic field on a 2D periodic structure. In the case of a superconducting wave function this

Externí odkaz: http://arxiv.org/abs/cond-mat/9907187

Disturbance effects in EUV interferometric lithography affecting interference fringes

Autor: Saïb, M., Constancias, C., Michallon, P., Dalzotto, B., Besacier, M.

Publikováno v: MNC Conference
MNC Conference, 2009, Sapporo, Japan

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::4175b341d5b2ded84f5d267089a190d8
https://hal.archives-ouvertes.fr/hal-00461058

Resolution limit of negative tone chemically amplified resists used for hybrid lithography: influence of the molecular weight

Autor: Pain, L., Gourgon, C., Higgins, C., Scarfogliere, B., Tedesco, S., Dalzotto, B., Ribeiro, M., Takeyama, R., Kusumoto, T., Suetsugu, T.

Publikováno v: J. Vac.Sci.Technol
J. Vac.Sci.Technol, 2000, pp.B18 (6), 3388
Journal of Vacuum Science and Technology
Journal of Vacuum Science and Technology, 2000, pp.B18 (6), 3388

International audience

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::c14284c6cf0406236bbc4e0f78303a4d
https://hal.archives-ouvertes.fr/hal-00385717

Measuring acid generation efficiency in chemically amplified resists with all 3 beams

Autor: Szmanda, C.R., Brainard, R.L., Mackevich, J.F., Awaji, A., Tanaka, T., Yamada, Y., Bohland, J., Tedesco, S., Dalzotto, B., Bruenger, W., Torkler, M., Fallmann, W., Loeschner, H., Kaesmaier, R., Nealey, P.M., Pawloski, A.R.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od_______610::83f162d3e3006ba8ec59be88aadc45fb
https://publica.fraunhofer.de/handle/publica/194375

Design requirements for a stand alone EUV interferometer.

Autor: Michallon, Ph., Constancias, C., Lagrange, A., Dalzotto, B.

Publikováno v: Proceedings of SPIE; Nov2008, Issue 1, p69213Y-69213Y-9, 9p