Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Dallas Lea"'
Autor:
Alireza Gharabaghi, Idil Cebi, Dallas Leavitt, Maximilian Scherer, Patrick Bookjans, Bastian Brunnett, Luka Milosevic, Daniel Weiss
Publikováno v:
npj Parkinson's Disease, Vol 10, Iss 1, Pp 1-12 (2024)
Abstract Deep brain stimulation (DBS) with electric field steering may avoid areas responsible for side effects. This prospective randomized cross-over trial compared omnidirectional (OS) and directional (DS) subthalamic DBS in 19 patients. Electromy
Externí odkaz:
https://doaj.org/article/83135acb4c7b4773b6ee8d2b5739421a
Autor:
A. Gaul, Andrew M. Greene, T. Levin, Dallas Lea, Victor Chan, Samuel S. Choi, Carol Boye, S. Mattam, J. S. Strane, Sean Teehan, Dechao Guo, Gauri Karve, Marc A. Bergendahl, Brad Austin, Kangguo Cheng
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 32:393-399
We detail the use of ring oscillators (ROs) for yield learning during the research phase of a CMOS technology generation. Failing circuits are located and classified based on electrical analysis of ROs and FETs (Field Effect Transistor) wired out fro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fb346177db8ff7cde9e74ff311de6222
https://doi.org/10.1109/tsm.2019.2945696
https://doi.org/10.1109/tsm.2019.2945696
Autor:
Dallas Leavitt, Frhan I. Alanazi, Tameem M. Al-Ozzi, Melanie Cohn, Mojgan Hodaie, Suneil K. Kalia, Andres M. Lozano, Luka Milosevic, William D. Hutchison
Publikováno v:
Neurobiology of Disease, Vol 195, Iss , Pp 106490- (2024)
The auditory oddball is a mainstay in research on attention, novelty, and sensory prediction. How this task engages subcortical structures like the subthalamic nucleus and substantia nigra pars reticulata is unclear. We administered an auditory OB ta
Externí odkaz:
https://doaj.org/article/7527173c5adf4b3a878a21cb2bc8fb12
Autor:
Anuja De Silva, Romain Lallement, Dario L. Goldfarb, Jennifer Church, Karen Petrillo, Dallas Lea, Cody Murray, Martin Burkhardt, Stuart A. Sieg, Nelson Felix, Luciana Meli
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XII.
In 2015 IBM announced the first 7 nm test chip patterned with Extreme Ultraviolet Lithography (EUV) technology, enabling 36nm back end of the line (BEOL) metal pitch and self-aligned contact. Five years later, EUV has become the mainstream enabler fo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5d9ccacda2530d3d00ca8ba13b262b01
https://doi.org/10.1117/12.2583566
https://doi.org/10.1117/12.2583566
Autor:
Dallan McMahon, Ryan M. Jones, Rohan Ramdoyal, Joey Ying Xuan Zhuang, Dallas Leavitt, Kullervo Hynynen
Publikováno v:
Pharmaceutics, Vol 16, Iss 10, p 1289 (2024)
Background/Objectives: Focused ultrasound (FUS) and microbubble (MB) exposure is a promising technique for targeted drug delivery to the brain; however, refinement of protocols suitable for large-volume treatments in a clinical setting remains undere
Externí odkaz:
https://doaj.org/article/a0199cfd35a6458abbf48b60d2b948ad
Autor:
Marc A. Bergendahl, Carol Boye, Jay W. Strane, Gauri Karve, Dechao Guo, T. Levin, S. Mattam, Dallas Lea, Kangguo Cheng, S. Choi, A. Gaul, Sean Teehan, Andrew M. Greene, Brad Austin, Victor S. Chan
Publikováno v:
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Ring oscillators (ROs) are used for yield learning during the research phase of a CMOS technology generation. Based on electrical data and binning methods, we improve detection and classification fault methodologies and form a yield detractor pareto.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2e81b5a0ec8f716f3126929b2bad3fd7
https://doi.org/10.1109/asmc.2019.8791793
https://doi.org/10.1109/asmc.2019.8791793
Autor:
Marc A. Bergendahl, Chun-Wing Yeung, Victor S. Chan, Dechao Guo, Dallas Lea, Gauri Karve, T. M. Levin
Publikováno v:
2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
We detail the use of ring oscillators (ROs) for yield learning during the research phase of a CMOS technology generation. Failing circuits are located and classified based on electrical analysis of ROs and FETs (Field Effect Transistor) wired out fro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f3db2de96be3b3bc44f5c39d34778d1a
https://doi.org/10.1109/asmc.2018.8373160
https://doi.org/10.1109/asmc.2018.8373160
Autor:
Dylan C. M. Yeates, Dallas Leavitt, Sajeevan Sujanthan, Nisma Khan, Denada Alushaj, Andy C. H. Lee, Rutsuko Ito
Publikováno v:
Nature Communications, Vol 13, Iss 1, Pp 1-13 (2022)
The ventral hippocampal CA3 and CA1 subfields play a critical role in the resolution of approach-avoidance conflict. Here the authors show that the subfields contribute to the regulation of this behavior through topographically distinct projections t
Externí odkaz:
https://doaj.org/article/0f7b8bc461a64c22b879eed722bb5fa7
Autor:
Stephen R. Fox, Oliver D. Patterson, K. Miller, J. Rice, Ishtiaq Ahsan, Katherine V. Hawkins, Xu Ouyang, Dallas Lea, D. Riggs, B. Ebersman
Publikováno v:
2007 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Yield learning during early technology development is critical to ensuring successful integration of new process technologies, meeting development schedules, and transitioning smoothly into manufacturing. However, yield learning in early technology d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::129e138bdd9c905ceaa6044c8cc3ff93
https://doi.org/10.1109/asmc.2007.375059
https://doi.org/10.1109/asmc.2007.375059
Publikováno v:
Advances in Resist Technology and Processing XIV.
We have used an i-line negative tone photoresist to define submicron masking features with contact lithography for applications in plasma etching, wet chemical processing, and liftoff. The resist used for our study is the Futurrex NR8 series. It is b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::463ab6d26b29b544815f18e4a9e97693
https://doi.org/10.1117/12.275873
https://doi.org/10.1117/12.275873