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pro vyhledávání: '"Dale Edward Ibbotson"'
Publikováno v:
Journal of The Electrochemical Society. 143:2029-2035
We demonstrate that the endpoint of an etching process can be determined by monitoring only values in the plasma tool's radio-frequency (RF) power system, the reflected power from the plasma source and wafer platen power supplies, capacitor values in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::184cd4a44dc6fd2b02a221f5ee13d9ef
https://doi.org/10.1149/1.1836944
https://doi.org/10.1149/1.1836944
