Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Dale E. Ewbank"'
Autor:
Stefan F. Preble, Dale E. Ewbank, Jeffrey A. Steidle, Sanjna Lakshminarayanamurthy, Michael L. Fanto, Paul Thomas, Nathan A. Rummage, N. A. Mogent
Publikováno v:
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Silicon Photonics is a promising new technology for realizing efficient, high performance interconnects. There is a growing need for educating future engineers on how to design, fabricate, test and package Silicon photonic circuits. Here we demonstra
Publikováno v:
2010 IEEE Frontiers in Education Conference (FIE).
The President of Rochester Institute of Technology, Dr. William Destler announced in 2007 renewed emphasis on innovation and creativity in engineering education from the beginning in undergraduate and graduate education. The Microelectronic Engineeri
Autor:
Dale E. Ewbank
Publikováno v:
International Optical Design Conference and Optical Fabrication and Testing.
A Pohl fringe-producing system is used to measure phase for reflective electro-optical micro-devices at visible wavelengths. Relative phase versus voltage is extracted for devices utilizing polymer dispersed liquid crystal materials as the active lay
Autor:
J. Tierney, Santosh K. Kurinec, M. Wiegand, R.L. Lane, R.E. Pearson, S. Widlund, Karl D. Hirschman, Lynn Fuller, Sean L. Rommel, S.P. Blondell, M.A. Jackson, Bruce W. Smith, Dale E. Ewbank, M. Arquette, C. Gruener
Publikováno v:
2006 16th Biennial University/Government/Industry Microelectronics Symposium.
Rochester Institute of Technology started the nation's first Bachelor of Science program in Microelectronic Engineering in 1982. The program has kept pace with the rapid advancements in semiconductor technology, sharing 25 of the 40 years characteriz
Autor:
Dale E. Ewbank
Publikováno v:
Frontiers in Optics.
A system to measure phase for reflective electro-optical micro-devices at visible wavelengths was developed. Relative phase versus voltage is required for control design of devices utilizing electro-optic materials such as polymer dispersed liquid cr
Autor:
Bruce W. Smith, Dale E. Ewbank
Publikováno v:
SPIE Proceedings.
A method of assist feature OPC layout is introduced using a frequency model-based approach. Through low-pass spatial frequency filtering of a mask function, the local influence of zero diffraction energy can be determined. By determining isofocal int
Autor:
Charles A. Sauer, Anne Rudack, Robert L. Dean, Etsuya Morita, Sid P. Duttagupta, Zoilo C. H. Tan, Bruce W. Smith, Dale E. Ewbank
Publikováno v:
SPIE Proceedings.
The SIA roadmap has identified CD control as a critical issue in mask making. PBS, the most popular resist used for electron-beam mask making in the U.S., may not perform at the level required for production of 250 nm devices. There is a need in the
Autor:
Dale E. Ewbank, Scott M. Ashkenaz
Publikováno v:
Optical Microlithography II: Technology for the 1980s.
Defect types for chrome photomask blanks are defined. Their probable causes and effects on device yield are explained. Three systems are presented which can detect pinholes, surface defects, or both. Repeatability and detection probability of pinhole
Autor:
Lynn Fuller, Karl D. Hirschman, Sean L. Rommel, Surendra K. Gupta, Santosh K. Kurinec, R.E. Pearson, Davide Mariotti, M.A. Jackson, Dale E. Ewbank
Publikováno v:
ResearcherID
The Department of Microelectronic Engineering at Rochester Institute of Technology received NSF Department Level Reform (DLR) planning and implementation grants in 2003–04 and 2005–10, respectively. The primary mission of these efforts was to eva
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