Zobrazeno 1 - 10
of 21
pro vyhledávání: '"Dale C. Flanders"'
Autor:
Mark E. Kuznetsov, Nate Kemp, Dale C. Flanders, Bart Johnson, Peter S. Whitney, Walid Atia, Brian Goldberg
Publikováno v:
Optics express. 24(10)
A back-to-back comparison of a tunable narrow-band-filtered SLED (TSLED) and a swept laser are made for OCT applications. The two sources are similar in terms of sweep speed, tuning range and coherence length. A fundamental issue with a TSLED is that
Autor:
Brian Goldberg, Nate Kemp, Peter S. Whitney, Bart Johnson, Mark E. Kuznetsov, Walid A. Atia, Dale C. Flanders
Publikováno v:
Optical Coherence Tomography and Coherence Domain Optical Methods in Biomedicine XX.
A back-to-back comparison of a tunable narrow-band SLED (TSLED) and a swept laser are made for OCT applications. Both are 1310 nm sources sweeping at 50 kHz over a 100 nm tuning range and have similar coherence lengths. The TSLED consists of a seed S
Autor:
Bart Johnson, Mark E. Kuznetsov, Walid A. Atia, Peter S. Whitney, Dale C. Flanders, Brian Goldberg
Publikováno v:
Biomedical Optics Express. 8:1045
It has been shown theoretically and experimentally that short cavity swept lasers are passively mode locked. We develop a mathematical model of these lasers and the light field solutions are used to predict the coherence length and coherence revival
Publikováno v:
SPIE Proceedings.
Traditional laboratory ultraviolet/visible/near-infrared spectroscopy instruments are tabletop-sized pieces of equipment that exhibit very high performance, but are generally too large and costly to be widely distributed for process control applicati
Autor:
Dale C. Flanders
Publikováno v:
Journal of Vacuum Science and Technology. 16:1615-1619
A new technique for fabricating high contrast X-ray masks with precisely controlled linewidths of less than 100 A is described. The technique is based on the deposition at an oblique angle ("shadowing") of X-ray absorber material onto relief structur
Publikováno v:
Annals of the New York Academy of Sciences. 342:203-212
Publikováno v:
Journal of Vacuum Science and Technology. 16:1626-1630
Fresnel zone plate patterns, free of spherical aberration, with diameters of up to 0.63 mm and linewidths as small as 1000 A were fabricated on polyimide membrane x‐ray masks using scanning electron beam lithography. Distortion of the electron beam
Publikováno v:
Journal of Vacuum Science and Technology. 16:1640-1643
Uniform crystallographic orientation of silicon films, 500 nm thick, has been achieved on amorphous fused silica substrates by laser crystallization of amorphous silicon deposited over surface‐relief gratings etched into the substrates by reactive
Publikováno v:
Applied Physics Letters. 35:71-74
Uniform crystallographic orientation of silicon films, 500 nm thick, has been achieved on amorphous fused‐silica substrates by laser crystallization of amorphous silicon deposited over surface‐relief gratings etched into the substrates. The grati
Autor:
Dale C. Flanders, Henry I. Smith
Publikováno v:
Journal of Vacuum Science and Technology. 17:533-535
The radiation used in x‐ray lithography spans a rather broad range, from about 4 to 50 A. At the short wavelength end, transmission through mask membranes and vacuum windows is high, and minimum linewidth is of the order of 1/2 μm. At the long wav