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Autor:
Daito Ueda, Ryosuke Miyata, Rika Tsubota, Naoki Osawa, Ikuhiro Tanida, Satoshi Osawa, Koichi Nakata
Publikováno v:
IEEE Transactions on Plasma Science. 51:333-341
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ffec64f4a4f6cf15684dfc40863b30e
https://doi.org/10.1109/tps.2022.3205008
https://doi.org/10.1109/tps.2022.3205008
