Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Daisy Zhou"'
Autor:
Brian Woodall, Mariel Borowitz, Kari Watkins, Maria Costa, Angela Howard, Perrine Kemerait, Michelle Lee, Gavin Rolls, Yuji Takubo, Rachel Titshaw, Maria Winstead, Jessica Zhang, Daisy Zhou
Publikováno v:
International Journal of Urban Sciences. :1-23
Autor:
Dunja Radisic, Maryam Hosseini, Hans Mertens, Daisy Zhou, Victor Vega Gonzalez, Shouhua Wang, B.T. Chan, Dmitry Batuk, Emmanuel Dupuy, Zheng Tao, Eugenio Dentoni Litta, Naoto Horiguchi
Publikováno v:
Advanced Etch Technology and Process Integration for Nanopatterning XII.
Publikováno v:
Proceedings of the Human Factors and Ergonomics Society Annual Meeting. 65:1347-1351
The COVID-19 pandemic has expedited the growing rate of reliance on telehealth. Beyond the benefits of telehealth for patients and healthcare providers during atypical circumstances, the changes prompted by the pandemic have possibly altered the posi
Publikováno v:
American journal of obstetricsgynecology MFM. 1(3)
Background Management of the second stage of labor continues to be a clinical challenge with unclear indications for abandoning attempts at spontaneous vaginal delivery. The conflict between diminishing chances of spontaneous vaginal delivery and inc
Publikováno v:
The FASEB Journal. 33
Publikováno v:
American Journal of Obstetrics and Gynecology. 220:S74-S75
Autor:
Kazuhisa Hasumi, Raf Appeltans, Osamu Inoue, Takumichi Sutani, Paulina Rincon Delgadillo, Naoto Horiguchi, Yutaka Okagawa, Masami Ikota, Basoene Briggs, R. Delhougne, Laurent Souriau, Tom Raymaekers, Christopher J. Wilson, Geert Van den bosch, G. L. Donadio, Arnaud Furnemont, Siddharth Rao, Andrea Fantini, Daisy Zhou, D. Crotti, Luca Di Piazza, Anabela Veloso, Takeyoshi Ohashi, Gouri Sankar Kar, Philippe Leray, Astuko Yamaguchi, Chi Lim Tan, Danilo De Simone, Nadine Collaert, Jürgen Bömmels, Toru Ishimoto, Shunsuke Koshihara, Anne-Laure Charley, Farrukh Yasin, Gian Lorusso
Publikováno v:
SPIE Proceedings.
The CD SEM (Critical Dimension Scanning Electron Microscope) is one of the main tools used to estimate Critical Dimension (CD) in semiconductor manufacturing nowadays, but, as all metrology tools, it will face considerable challenges to keep up with