Zobrazeno 1 - 10
of 33
pro vyhledávání: '"Daiju Shiono"'
Publikováno v:
ARKIVOC, Vol 2005, Iss 15, Pp 39-43 (2005)
Externí odkaz:
https://doaj.org/article/525819aac01345b7bcdb58f838cf4474
Autor:
Yuichi Haruyama, Katsumi Ohmori, Daiju Shiono, Tetsuo Harada, Takeo Watanabe, Hirohito Tanino, Masato Yamaguchi, Hiroo Kinoshita, Kazufumi Sato, Kazuya Emura, Tsubasa Fukui, Yasuji Muramatsu
Publikováno v:
Journal of Photopolymer Science and Technology. 27:631-638
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::afac2a8eb325b1b049962866adc8c59b
https://doi.org/10.2494/photopolymer.27.631
https://doi.org/10.2494/photopolymer.27.631
Autor:
Daiju Shiono, Yasuji Muramatsu, Tetsuo Harada, Takeo Watanabe, Yuichi Haruyama, Katsumi Ohmori, Kazuya Emura, Hiroo Kinoshita, Kazufumi Sato
Publikováno v:
Journal of Photopolymer Science and Technology. 26:635-641
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1e952270a1b6890935e074e65ea8cf2d
https://doi.org/10.2494/photopolymer.26.635
https://doi.org/10.2494/photopolymer.26.635
Autor:
Daiju Shiono, Kazuya Emura, Tetsuo Harada, Takeo Watanabe, Takuro Urayama, Yuichi Haruyama, Hiroo Kinoshita
Publikováno v:
Journal of Photopolymer Science and Technology. 25:569-573
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::717c53fb576df5ee7bb7e0ac1a58645f
https://doi.org/10.2494/photopolymer.25.569
https://doi.org/10.2494/photopolymer.25.569
Publikováno v:
Journal of Photopolymer Science and Technology. 23:649-655
Molecular resists of Prot-2 and Prot-1 were synthesized for decomposition analysis and lithographic evaluation. After checking their structure, purity and thermal property, decomposition behavior was analyzed by high performance liquid chromatography
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a1bafb289588738bfd7744b38c417c3e
https://doi.org/10.2494/photopolymer.23.649
https://doi.org/10.2494/photopolymer.23.649
Publikováno v:
Journal of Photopolymer Science and Technology. 22:737-741
Molecular resist material having only one protecting group per molecule (Prot-1) was designed and synthesized. After confirming the structure and purity of Prot-1, Resist-A formulated with Prot-1 as a base material was prepared. Resist-A showed good
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c1da6793e36e00715375b8a6e9559d2f
https://doi.org/10.2494/photopolymer.22.737
https://doi.org/10.2494/photopolymer.22.737
Autor:
Yuusuke Tanaka, Junichi Onodera, Daiju Shiono, Takaaki Kumise, Atsuko Yamaguchi, Hiroaki Oizumi, Iwao Nishiyama, Hideo Hada, Taku Hirayama
Publikováno v:
Microelectronic Engineering. 84:1049-1053
We designed and synthesized a new partially-protected polyphenol, 25X-MBSA-M, for which the position and number of protected hydroxyl groups have no dispersion, and evaluated the EUV patterning performance of a chemically amplified positive-tone resi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::72e3bfb64fd450a1828b574f704167b6
https://doi.org/10.1016/j.mee.2007.01.052
https://doi.org/10.1016/j.mee.2007.01.052
Autor:
Hiroshi Fukuda, Kyoko Kojima, Hiroto Yukawa, Hiroaki Oizumi, Hideo Hada, Daiju Shiono, Iwao Nishiyama
Publikováno v:
Microelectronic Engineering. 84:1084-1087
We have designed and synthesized a molecular resist material, which has no distribution of the protecting groups and have evaluated its performance as a molecular resist with EB and EUV exposure tool. The molecular resist attained a resolution of sub
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8f764d4d7573b53ab08e1b625dc7c678
https://doi.org/10.1016/j.mee.2007.01.146
https://doi.org/10.1016/j.mee.2007.01.146
Autor:
Taku Hirayama, Junichi Onodera, Takaaki Kumise, Hideo Hada, Yuusuke Tanaka, Daiju Shiono, Atusko Yamaguchi, Iwao Nishiyama, Hiroaki Oizumi
Publikováno v:
Journal of Photopolymer Science and Technology. 20:403-410
We designed and synthesized a new partially-protected polyphenol, 25X-MBSA-M, for which the position and number of protected hydroxyl groups have no dispersion, and evaluated the EUV patterning performance of a chemically amplified positive-tone resi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d48b543424d2e008d917bcf974c406ea
https://doi.org/10.2494/photopolymer.20.403
https://doi.org/10.2494/photopolymer.20.403
Publikováno v:
Journal of Photopolymer Science and Technology. 20:429-436
In order to enable design of a negative-tone polyphenol resist using polarity-change reaction, five resist compounds (3M6C-MBSA-BLs) with different number of a functional group of γ-hydroxycarboxyl acid were prepared and evaluated by EB lithography.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aeefeecc23ba189f0c8e22ac761e655b
https://doi.org/10.2494/photopolymer.20.429
https://doi.org/10.2494/photopolymer.20.429