Zobrazeno 1 - 1
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pro vyhledávání: '"Daigo Hoshino"'
Publikováno v:
SPIE Proceedings.
We developed a new focus monitoring method that is simple yet highly accurate. We used simple measurement tools: a conventional binary mask and an optical overlay inspection machine. Our method was sufficiently precise to detect sub-100nm focus error
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::da30f0c572e0145c7bcd46185e9224a2
https://doi.org/10.1117/12.485353
https://doi.org/10.1117/12.485353
