Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Daegeun Ha"'
Publikováno v:
Process Safety and Environmental Protection. 135:113-125
As fault detection technologies have been developed, process fault diagnosis at early abnormal stage has come to be considered a major problem. In this work, a method to analyze the root cause of faults is developed to provide proper information at t
Publikováno v:
Computers & Chemical Engineering. 106:96-105
LNG mixed refrigeration (MR) process is usually used for liquefying natural gas. The compressors for refrigerant compression are associated with the high-speed rotating parts to create a high-pressure. However, any malfunction in the compressors can
Publikováno v:
Industrial & Engineering Chemistry Research. 56:7260-7272
Process monitoring and fault diagnosis using the multivariate statistical methodologies has been extensively used in the process and product development industries for the last several decades. The fault in one process variable readily affects all th
Autor:
Daegeun Ha, Damdae Park, Chonghun Han, Junmo Koo, Kye Hyun Baek, Hyun-Joon Roh, Gon-Ho Kim, Sangwon Ryu
Publikováno v:
Computers & Chemical Engineering. 100:38-47
With the advent of more than Moore’s law era, control of plasma etch process is expected to become inevitable. Given that highly complex plasma is a medium of etch processes, plasma parameters are key factors to be controlled. In addition, highly i
Publikováno v:
Chemometrics and Intelligent Laboratory Systems. 162:73-82
Multivariate statistical methods for process monitoring are attaining a lot of attention in chemical and process industries to enhance both the process performance and safety. The fault in one process variable readily affects the other variables whic
Publikováno v:
2019 19th International Conference on Control, Automation and Systems (ICCAS).
Efficient operation of the polyethylene (PE) process is greatly dependent on the correct prediction or estimation of the properties including melt index, density and production rate. However, direct measurement of resin property has limitation due to
Publikováno v:
Computers & Chemical Engineering. 94:362-369
To cope with a cost-effective manufacturing approach driven by more than Moore’s law era, plasma etching which is one of the major processes in semiconductor manufacturing has developed plasma sensors and their applications. Among the plasma sensor
Autor:
Krishnadash S. Kshetrimayum, Yeongbeom Lee, Seolin Shin, Chul-Jin Lee, Yong Kyu Lee, Ikhwan Jung, Jonggeol Na, Daegeun Ha, Chonghun Han, Seongeon Park, Jongtae Chung, Seongho Park
Publikováno v:
Chemical Engineering Science. 143:63-75
The objective of this study is to design a microchannel Fischer–Tropsch reactor with the evaluation of several flow configurations and distribution effect. A cell coupling computation was carried out for the microchannel reactor of five different f
Publikováno v:
Journal of Institute of Control, Robotics and Systems. 21:875-880
Traditional semiconductor process control has been performed through statistical process control techniques in a constant process-recipe conditions. However, the complexity of the interior of the etching apparatus plasma physics, quantitative modelin
Publikováno v:
The Journal of Korea Robotics Society. 8:20-28
Large workspace and strong grasping force are required when a robot manipulates big and/or heavy objects. In that situation, bimanual manipulation is more useful than unimanual manipulation. However, the control of both hands to manipulate an object