Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Dae-Youp Lee"'
Publikováno v:
Microelectronic Engineering. 104:33-36
An attenuated phase shift mask (PSM) (half-tone PSM) is an effective and common technique for resolution enhancement and for forming specific patterns. When an ArF-attenuated PSM with hole- or space-type patterns is used under a KrF light source scan
Publikováno v:
Journal of Photopolymer Science and Technology. 14:475-480
Publikováno v:
Molecular Crystals and Liquid Crystals Science and Technology. Section A. Molecular Crystals and Liquid Crystals. 227:317-324
Soluble 1:1 alternating copolymers of p-tert-butylstyrene, p-(trimethyl silyl)styrene, p-(trimethylgermyl)styrene, and 3-vinylbenzyltrimethylsilane with sulfur dioxide have been synthesized by tert-butylhydroperoxide-initiated copolymerization at T <
Autor:
Dong-Hyun Kim, Soo-Han Choi, Moon-Hyun Yoo, Jeong-Taek Kong, Eun-Sung Kim, Yongchan Ban, A-Young Je, Dae-Youp Lee, Hyoung-Joo Youn, Yoo-Hyon Kim, Tae-Hoon Park, Ji-Suk Hong
Publikováno v:
Optical Microlithography XVIII.
The k1 factor of the 65nm node device approaches to around 0.3 or even below because the device shrinking is much faster than the development speed of the high NA ArF scanner. Since the conventional model-based OPC (MBOPC) is only focused on patterni