Výsledky vyhledávání

Akademický článek

Optimization of CMP processing parameters for Si based on response surface method

Autor: Da BIAN, Enmin SONG, Zifeng NI, Shanhua QIAN, Yongwu ZHAO

Publikováno v: Jin'gangshi yu moliao moju gongcheng, Vol 42, Iss 6, Pp 745-752 (2022)

To improve the polishing efficiency and precision, the optimum processing parameters of Si in the chemical mechanical polishing (CMP) process were analysed by CMP experiments and response surface methodology. The results show that polishing pressure

Externí odkaz: https://doaj.org/article/13d1af4ab52e402c912a85f4821456f7

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Akademický článek

Effect of complexing agent on chemical-mechanical polishing effect of 316L stainless steel

Autor: Guomei CHEN, Chunkuan DU, Zifeng NI, Da BIAN, Hao WANG, Ping ZHANG, Xin ZHANG

Publikováno v: Jin'gangshi yu moliao moju gongcheng, Vol 42, Iss 6, Pp 753-759 (2022)

To improve the chemical mechanical polishing (CMP) performance of 316L stainless steel, the effect and its mechanism of complexing agent types on the CMP process of 316L stainless steel were studied. The influence of complexing agent types, including

Externí odkaz: https://doaj.org/article/fa5a041efcc04f05ab7d1405f7e531c5

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Akademický článek

Preparation of homogeneous sub-micron cerium oxide polishing powder

Autor: Mengjiao DAI, Guomei CHEN, Zifeng NI, Ping ZHANG, Shanhua QIAN, Da BIAN

Publikováno v: Jin'gangshi yu moliao moju gongcheng, Vol 42, Iss 4, Pp 428-432 (2022)

To obtain homogeneous submicron cerium dioxide (CeO2) polishing powder, CeO2 was synthesized by solvothermal reaction using cerium nitrate (Ce(NO3)3·6H2O) as cerium resource and alcohol-water mixed solution as solvent. The phase composition and morp

Externí odkaz: https://doaj.org/article/34b5dfabac3e4be99e8c3a1dd982cdf8

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