Zobrazeno 1 - 6
of 6
pro vyhledávání: '"DS Nam"'
Autor:
Paul van Adrichem, DS Nam, Jan Mulkens, Emily Gallagher, Andreas Frommhold, Marleen Kooiman, Vidya Vaenkatesan, Michael Kubis, Lieve Van Look
Publikováno v:
Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology.
The mask is a known contributor to intra-field fingerprints at the wafer level. Traditionally, a 3σ distribution of critical dimensions (CDs) on mask was considered sufficient to characterize the contribution to the CD distribution at wafer level. R
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aec4a3c5421687e4c7b614cb727f5119
https://doi.org/10.1117/12.2538243
https://doi.org/10.1117/12.2538243
Autor:
Lee J; Department of Animal Science and Technology, Konkuk University, Seoul, 05029 Republic of Korea., Nam DS; Department of Animal Science and Technology, Konkuk University, Seoul, 05029 Republic of Korea., Kong C; Department of Animal Science and Technology, Konkuk University, Seoul, 05029 Republic of Korea.
Publikováno v:
SpringerPlus [Springerplus] 2016 Apr 06; Vol. 5, pp. 419. Date of Electronic Publication: 2016 Apr 06 (Print Publication: 2016).
Autor:
Nam DS; Department of Animal Science, University of Alberta, Edmonton, Canada., Aherne FX, He P, Weingardt R, Schaefer AL
Publikováno v:
Journal of animal science [J Anim Sci] 1995 Mar; Vol. 73 (3), pp. 764-72.
Publikováno v:
Journal of animal science [J Anim Sci] 1994 May; Vol. 72 (5), pp. 1247-56.