Zobrazeno 1 - 1
of 1
pro vyhledávání: '"D. van den Broke"'
Autor:
C. Progler, S. Cassel, Matthew A. Thompson, R. Socha, Willard E. Conley, E. Schaefer, L. Dieu, K. Wampler, A. Verhappen, D. van den Broke, Chi-Min Yuan, L. Yu, Cesar M. Garza, J.-P. Kuijten, D. Mellenthin, Patrick K. Montgomery, Wei Wu, B. Kasprowicz, Kevin D. Lucas, E.L. Fanucchi, W. Pijnenburg, G. Hughes, Kirk J. Strozewski, Carla M. Nelson-Thomas, Russell L. Carter, K. Brankner, J.G. Maltabes
Publikováno v:
2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers..
Summary form only given. With half pitch k factors rapidly approaching sub 0.4, many lithography groups have looked seriously into alternative patterning and mask techniques. The semiconductor industry continues to explore numerous techniques for pri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a97c273de83dcd3fd9572059d46d06ba
https://doi.org/10.1109/imnc.2002.1178659
https://doi.org/10.1109/imnc.2002.1178659
