Zobrazeno 1 - 2
of 2
pro vyhledávání: '"D. W. Gotthold"'
Publikováno v:
Journal of Electronic Materials. 33:408-411
The AlGaN/GaN heterostructure field-effect transistors (HFETs) were grown on 4H-SiC substrates by metal-organic chemical-vapor deposition (MOCVD) with a range of Al compositions (30–35%) and AlGaN barrier thicknesses. Films with higher strains exhi
Autor:
S. P. Guo, D. W. Gotthold, L.F. Eastman, D. K. Gaskill, B. E. Albert, A. V. Vertiatchikh, O. J. Glembocki
Publikováno v:
AIP Conference Proceedings.
Electric fields in the GaN underlying the 2DEG of three GaN/AlGaN field effect transistor (FET) structures measured by photoreflectance (PR) using sub‐gap excitation were found to be about 210–260kVcm−1, indicating the presence of traps. The sa