Zobrazeno 1 - 10
of 30
pro vyhledávání: '"D. Valdaitsev"'
Publikováno v:
Thin Solid Films. 518:4030-4034
Emission electron microscopy was used to study the electron emission observed under the passage of a tunnel current through a silver nanoparticle film when a voltage is applied to it. The electron emission originates from separate emission centers em
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::757b66477f8a8fe13ebad9ea1548c78c
https://doi.org/10.1016/j.tsf.2010.01.021
https://doi.org/10.1016/j.tsf.2010.01.021
Publikováno v:
Surface Science. 601:4706-4713
Silver cluster films deposited on Si(1 1 1) were investigated by spectroscopic photoelectron microscopy using fs-laser excitation tuneable between hν = 1.45–1.65 eV and 2.9–3.3 eV. With increasing coverage the films grown as stepped wedges first
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c907e870bb6f2e0de466660d5a06327a
https://doi.org/10.1016/j.susc.2007.05.046
https://doi.org/10.1016/j.susc.2007.05.046
Publikováno v:
MATERIALS TRANSACTIONS. 48:936-939
Mechanisms responsible for the contrast between differently doped areas in semiconductors, which is observed in electron micrographs, is discussed as regards the key factors determining the sign and magnitude of the contrast. Experimental data obtain
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c734082dbfb02f43d048371e57fe8971
https://doi.org/10.2320/matertrans.48.936
https://doi.org/10.2320/matertrans.48.936
Autor:
Hubert Brückl, M. Escher, M. Schicketanz, Gerd Schönhense, J. Slieh, T. Westerwalbesloh, N. Weber, M. Merkel, A. Wonisch, Ulrich Heinzmann, Ulrich Neuhäusler, J. Lin, Ulf Kleineberg, Armin Brechling, D. Valdaitsev, Andreas Oelsner, M. Brzeska
Publikováno v:
Microelectronic Engineering. 83:680-683
Extreme ultraviolet lithography (EUVL) at 13.5 nm is the next generation lithography technique capable of printing sub-50 nm structures. With decreasing feature sizes to be printed, the requirements for the lithography mask also become more stringent
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::343650694bd30aa5194b64d3c02ef859
https://doi.org/10.1016/j.mee.2005.12.035
https://doi.org/10.1016/j.mee.2005.12.035
Publikováno v:
Applied Physics A. 80:731-734
Single crystalline patterned Mo(110) films have been prepared on \({\rm Al_2O_3(11\overline{2}0)}\) using standard lithographical techniques, that can be used as a substrate for 3d magnetic metals epitaxy. The preparation procedure, and the structura
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::45a036029b535421fe6dcbb8694cccec
https://doi.org/10.1007/s00339-004-3137-5
https://doi.org/10.1007/s00339-004-3137-5
Publikováno v:
Applied Physics A. 79:707-712
Silver cluster films deposited on glass or sapphire have been investigated using an emission electron microscope when a voltage was applied across the film. The electric field distribution in the silver cluster film was measured exploiting the image
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0e662cd31e2d1846c7996f9df39ba73f
https://doi.org/10.1007/s00339-003-2318-y
https://doi.org/10.1007/s00339-003-2318-y
Autor:
Gerd Schönhense, Andreas Oelsner, D. Valdaitsev, Andrei Gloskovskii, Mirko Cinchetti, Sergej A. Nepijko
Publikováno v:
Journal of Electron Spectroscopy and Related Phenomena. :249-257
Time-of-flight photoemission electron microscopy was used to measure spatially resolved energy distribution curves of electrons emitted from Ag nanoparticle films with different mass thicknesses. Two-photon photoemission (2PPE) was induced by femtose
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a67cdfecedf99c9cc8d5ce19c01d377
https://doi.org/10.1016/j.elspec.2004.02.052
https://doi.org/10.1016/j.elspec.2004.02.052
Autor:
Gerhard H. Fecher, Florian Kronast, Claudia Felser, D. Valdaitsev, Andrei Gloskovskii, Gerhard Jakob, Hans-Joachim Elmers, Hermann A. Dürr, B Heitkamp, T. Block, Gerd Schönhense, D. Schmitz, Wolfgang Eberhardt, S. Wurmehl, Sergej A. Nepijko, Stefan Cramm
Publikováno v:
Journal of Physics: Condensed Matter. 15:7019-7027
Heusler compounds are promising candidates for future spintronics device applications. The electronic and magnetic properties of Co2Cr0.6Fe0.4Al, an electron-doped derivative of Co2CrAl, are investigated using circularly polarized synchrotron radiati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8fc294ebd06cdc99c531327d278b55ce
https://doi.org/10.1088/0953-8984/15/41/010
https://doi.org/10.1088/0953-8984/15/41/010
Autor:
Michael Bauer, Andrei Gloskovskii, L. V. Viduta, M. Klimenkov, Petro M. Tomchuk, Mirko Cinchetti, D. Valdaitsev, Martin Aeschlimann, J. Lange, Sergej A. Nepijko, Gerd Schönhense
Publikováno v:
Physical Review B. 77
Electron emission from Ag and Au nanoparticle films was studied under excitation with femtosecond-laser pulses with photon energies of 1.55 and $3.1\phantom{\rule{0.3em}{0ex}}\mathrm{eV}$. Films were grown on a glass substrate with particle sizes fro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0decfab63d20c63647d27c2540020a24
https://doi.org/10.1103/physrevb.77.195427
https://doi.org/10.1103/physrevb.77.195427
Autor:
Gerd Schönhense, Sergej A. Nepijko, Hans-Joachim Elmers, Miloš Hovorka, Luděk Frank, D. Valdaitsev
Publikováno v:
Journal of microscopy. 230(Pt 1)
Differently doped areas in silicon can show strong electron-optical contrast in dependence on the dopant concentration and surface conditions. Photoemission electron microscopy is a powerful surface-sensitive technique suitable for fast imaging of do
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5931b59857cea3aa9d02524dace6dc30
https://pubmed.ncbi.nlm.nih.gov/18387038
https://pubmed.ncbi.nlm.nih.gov/18387038