Zobrazeno 1 - 10
of 17
pro vyhledávání: '"D. V. Grigor'ev"'
Publikováno v:
Russian Journal of Applied Chemistry. 95:836-848
Autor:
D. V. Grigor’ev, D. V. Lyapunov, A. V. Voitsekhovskii, Stanislav M. Dzyadukh, Sergey N. Nesmelov
Publikováno v:
Russian physics journal. 2017. Vol. 60, № 1. P. 128-139
Capacitance-voltage (C–V) characteristics of MIS structures based on the graded-gap n-Hg1–x Cd x Te (x = 0.22–0.40) grown by molecular-beam epitaxy were experimentally studied in the temperature range of 9–77 K. The concentrations of majority
Autor:
Evgeniy I. Lipatov, D. E. Genin, D. V. Grigor’ev, Victor F. Tarasenko, E. Kh. Baksht, Alexander G. Burachenko, Dmitry V. Beloplotov
Publikováno v:
AIP Conference Proceedings. 2019. Vol. 2069. P. 040007-1-040007-8
In our paper we report about the optical properties of diamonds having applied sense. Radiation destruction manifests itself in the form of absorption bands and luminescence of vacancies and interstitials. The charge state of the NV centers depends o
Publikováno v:
Russian Physics Journal. 57:345-358
Processes of formation of n + –n−–p-structures in boron-implanted heteroepitaxial (HEL) CdxHg1–xTe (CMT) layers of p-type grown by molecular beam epitaxy (HEL CMT MBE) with different compositions of the upper graded-gap layer are studied. It
Autor:
Victor F. Tarasenko, M. A. Shulepov, A. P. Kokhanenko, D. V. Grigor’ev, A. G. Korotaev, A. V. Voitsekhovskii
Publikováno v:
Russian Physics Journal. 54:1152-1155
The effect of a nanosecond volume discharge forming in an inhomogeneous electrical field at atmospheric pressure on the CdHgTe (MCT) epitaxial films of the p-type conduction with the hole concentration 2·1016 cm3 and mobility 500 cm2·V–1·s–1 i
Autor:
A. V. Dvurechenskii, O. P. Pchelyakov, A. V. Voitsekhovskii, D. V. Grigor’ev, A. P. Kokhanenko, A. I. Nikiforov
Publikováno v:
Russian Physics Journal. 53:943-948
Recently much attention has been paid to detailed examination of fundamental properties of Ge/Si heterostructures with Ge nanoclusters. In this work, we consider possible applications of the structures with Ge quantum dots in silicon optoelectonic an
Publikováno v:
Journal of Physics: Conference Series. 1115:052026
Publikováno v:
Russian Physics Journal. 52:441-447
The process of reconstuction of the distribution profile of hole concentration in the p +–n structure by the method of differential Hall measurements upon implantation of ions As+ (Е = 190 keV, D = 3.1014 cm-2, j = 0.025 μA/cm2) into epitaxial fi
Publikováno v:
Russian Physics Journal. 51:1001-1015
The results of investigations into the electrophysical properties of heteroepitaxial semiconductor material CdHgTe (CMT) grown by molecular-beam epitaxy (MBE) after ion implantation are reported. The major factors responsible for the differences betw
Autor:
N. Kh. Talipov, M. Posyatsk, I. I. Izhnin, D. V. Grigor’ev, V. S. Volkov, A. G. Korotaev, A. P. Kokhanenko, V. G. Sredin, A. V. Voitsekhovskii
Publikováno v:
Russian Physics Journal. 51:936-942
The results of investigations into spatial distribution of donors in p-HgCdTe graded band-gap layers with various composition profiles in the near-surface layer upon ion-beam etching are reported. It is found that the depth of the resulting n+-layer