Zobrazeno 1 - 10
of 10
pro vyhledávání: '"D. S. Soane"'
Publikováno v:
Journal of Applied Polymer Science. 47:1193-1206
For some binary systems, an extended Flory–Huggins equation is applicable to both vaporliquid equilibria (VLE) and liquid–liquid equilibria (LLE) using the same adjustable parameters. New LLE and VLE data are reported for polystyrene (PS) (MW = 1
Autor:
D. S. Soane, R. K. Yonkoski
Publikováno v:
Journal of Applied Physics. 72:725-740
A thorough investigation of the mass and momentum equations pertaining to the spin‐coating process has been performed. A scaling analysis forms the foundation to determine the relevant characteristic quantities of the process and allows the assumpt
Publikováno v:
Journal of Applied Physics. 71:2655-2662
We demonstrate that optical second‐harmonic generation (SHG) can be successfully used for in situ study of metal/polymer interfaces. With this SHG technique, Cu cluster formation on polyimide by surface diffusion and Cu diffusion into polyimide hav
Autor:
J. R. Dorgan, D. S. Soane
Publikováno v:
Molecular Crystals and Liquid Crystals Incorporating Nonlinear Optics. 188:129-146
The phase behavior of two nematic liquid crystals in a polymer host is studied using the technique of Thermal Optical Analysis. Results are compared to the predictions of a recent molecular model due to Ballauff and found to give very good agreement
Publikováno v:
Applied Physics Letters. 59:1305-1307
Optical second‐harmonic generation is shown to be an effective means for in situ monitoring of two competing dynamic processes of Cu deposited on polyimide aggregation by surface diffusion and implantation by diffusion into the bulk. It is also exp
Publikováno v:
Plasma-Surface Interactions and Processing of Materials ISBN: 9789401073691
Advanced multi-layer lithography techniques are currently being developed to meet future processing requirements.1 Both bi-layer processes,2 and the more recent gas-phase functionalized single layer processes3 aim to enhance etch resistance by buildi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::46614f2c1c704bdb6345f5e545ab3514
https://doi.org/10.1007/978-94-009-1946-4_33
https://doi.org/10.1007/978-94-009-1946-4_33
Autor:
D. R. Boyington, D. S. Soane
Publikováno v:
International Polymer Processing. 4:35-43
A method is developed for the simulation of the transient structure and rheology of concentrated suspensions of generally-shaped particles. This procedure is a modification of the Stokesian dynamics method using boundary element to evaluate the multi
Autor:
D. K. Sharma, D. S. Soane
Publikováno v:
Macromolecules. 21:700-710
Modele pour prevoir la masse moleculaire et l'evolution de la composition prenant en compte les theories de diffusion basees sur le volume libre
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 7:1
Oxygen‐based plasmas commonly used in resist stripping and multilayer resist patterning are contrasted to highlight the differences involved in these applications. Mechanisms for polymer etching are reviewed, with particular emphasis on silicon‐c
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 6:1892
Oxygen dissociation was measured in reactive ion etching (RIE) plasmas using a quadrupole mass spectrometer which sampled the particle flux through a pinhole in the lower electrode of a parallel‐plate reactor. The oxygen atom flux increased with in