Zobrazeno 1 - 10
of 16
pro vyhledávání: '"D. S. Milakhin"'
Autor:
Timur V. Malin, K. S. Zhuravlev, A. S. Kozhukhov, I. D. Loshkarev, D. S. Milakhin, Vladimir G. Mansurov, D. Yu. Protasov
Publikováno v:
Optoelectronics, Instrumentation and Data Processing. 56:485-491
It is demonstrated that it is possible to use the ammonia molecular beam epitaxy for growing structurally perfect high-ohmic GaN layers which allow generating SiN/Al(Ga)N/GaN heterostructures for transistors with a high mobility of electrons. The gro
Autor:
D. S. Milakhin, Timur V. Malin, K. S. Zhuravlev, N. V. Rzheutski, Yu. G. Galitsyn, E. V. Lebiadok, E. A. Razumets, I. A. Aleksandrov, Vladimir G. Mansurov, A. S. Kozhukhov
Publikováno v:
Physics of the Solid State. 61:2329-2334
The formation of GaN nanocrystals on the graphene-like AlN (g-AlN) modification and graphene-like (g-Si3N3) silicon nitride by ammonia molecular beam epitaxy has been investigated. It has been found that the GaN growth on the g-Si3N3 surface leads to
Publikováno v:
2021 IEEE 22nd International Conference of Young Professionals in Electron Devices and Materials (EDM).
The paper presents the results of a study of the effect of the elemental composition on the surface of the GaN layer on its surface energy. It was found for the first time that formation of GaN quantum dots on the AlN surface can occur with an increa
Publikováno v:
Optoelectronics, Instrumentation and Data Processing. 55:501-507
The paper presents the results of calculation and growth of AlGaN/AlN heteroepitaxial structures with Bragg reflectors for the blue-green spectral range corresponding to the maximum broadband luminescence of AlGaN:Si layers grown by molecular beam ep
Autor:
K. S. Zhuravlev, Vladimir G. Mansurov, D. Yu. Kazantsev, I. A. Aleksandrov, D. Yu. Protasov, A. A. Zaitsev, Timur V. Malin, A. S. Kozhukhov, D. S. Milakhin, B. Ya. Ber, V. E. Zemlyakov, V. I. Egorkin
Publikováno v:
Technical Physics Letters. 45:761-764
It is shown that intentionally undoped high-resistance GaN buffer layers in AlGaN/GaN heterostructures with high electron mobility for transistors can be formed by ammonia molecular beam epitaxy. The GaN growth conditions have been optimized using ca
Publikováno v:
2020 21st International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM).
In this work, using the RHEED technique, the optimal stage of sapphire nitridation completeness was determined taking into account the electron beam influence on a nitridation process. It was found that as a result of the sapphire surface nitridation
Autor:
Vladimir G. Mansurov, Yury Galitsyn, S. A. Teys, D. S. Milakhin, Timur V. Malin, Konstantin Zhuravlev
Publikováno v:
Applied Surface Science. 571:151276
Evolution of atomic and electronic structures during high temperature Si(1 1 1) surface nitridation under ammonia flux was studied in details by the STM/STS techniques. The adsorption and intermediate phases arising at low doses preceding the (8 × 8
Autor:
Vladimir G. Mansurov, V. Yu. Davydov, K. S. Zhuravlev, A. S. Kozhuhov, D. S. Milakhin, Yu. G. Galitsyn, Alexander N. Smirnov, V. V. Ratnikov, Timur V. Malin
Publikováno v:
Semiconductors. 52:789-796
The effect of atomic aluminum deposited onto sapphire substrates with different nitridation levels on the quality of AlN layers grown by ammonia molecular-beam epitaxy is investigated. The nitridation of sapphire with the formation of ~1 monolayer of
Publikováno v:
Journal of Thermal Analysis and Calorimetry. 133:1099-1107
Chemical kinetics of a two-dimensional (2D) AlN layer formation on the (0001) sapphire (Al2O3) surface during nitridation as function of ammonia flux and temperature is investigated by reflection high-energy electron diffraction. The process on the s
Publikováno v:
Journal of Physics: Conference Series. 1851:012005
The AlN phase transition on the (0001) Al2O3 surface was investigated. It was experimentally estimated that the AlN formation rate as a function of temperature has a different character in two temperature regions. In the region of relatively low temp