Zobrazeno 1 - 4
of 4
pro vyhledávání: '"D. K. Marble"'
Autor:
Paul H. Cox, V. L. Willson, O. Gonzalez, Qingwen Ni, P. J. Lawrence, Henry Leckenby, James Espinosa, Lionel D. Hewett, M. K. Balasubramanya, D. K. Marble, D. J. Suson
Publikováno v:
American Journal of Physics. 72:359-363
To preserve their undergraduate physics programs, a group of state universities in Texas has jointly offered upper level undergraduate physics courses through the Texas Electronic Coalition for Physics for the past nine years. At the start of the 200
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::94d78e5ce875c63405e23df969a23697
https://doi.org/10.1119/1.1643369
https://doi.org/10.1119/1.1643369
Autor:
S. Matteson, S. N. Renfrow, J.M. Anthony, D. K. Marble, F. D. McDaniel, Y.D. Kim, J.F. Kirchhoff
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 12:1547-1550
A Cs based secondary‐ion mass spectrometry (SIMS) instrument has been constructed and coupled to a 3 MV tandem accelerator to produce an accelerator mass spectrometry system for impurity detection in materials. Exposed surfaces of the ion optical e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7276fa0311d2c431336ba95430ffced8
https://doi.org/10.1116/1.579353
https://doi.org/10.1116/1.579353
Autor:
D. L. Weathers, R.L. Beavers, S. Matteson, F. D. McDaniel, T.J. Bennett, J.F. Kirchhoff, J.M. Anthony, D. K. Marble
Publikováno v:
Review of Scientific Instruments. 65:1570-1574
An ultraclean accelerator mass spectrometry negative ion source for semiconductor material mass analysis has been built and is in operation at the University of North Texas’ Ion Beam Modification and Analysis Laboratory (IBMAL). The source is uniqu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::daac5d0b3a0cc087ef1a0ddcfa01769f
https://doi.org/10.1063/1.1144893
https://doi.org/10.1063/1.1144893
Publikováno v:
Romano, Valerio; Meier, M.; Theodore, N. D.; Marble, D. K.; Nicolet, M.-A. (2011). Irradiation of amorphous Ta42Si13N45 film with a femtosecond laser pulse. Applied physics. A, Materials science & processing, 104(1), pp. 357-364. Springer-Verlag 10.1007/s00339-010-6149-3
Films of 260 nm thickness, with atomic composition Ta_(42)Si_(13)N_(45), on 4" silicon wafers, have been irradiated in air with single laser pulses of 200 femtoseconds duration and 800 nm wave length. As sputter-deposited, the films are structurally
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bf8dc2f471f480b33b0c91e065dedbcf
