Zobrazeno 1 - 7
of 7
pro vyhledávání: '"D. J. Szostak"'
Autor:
J. H. Thomas, F. J. Tams, D. M. Hoffman, H. Gilmartin, L. R. Hewitt, A.‐M. Lanzillotto, D. J. Szostak, J. T. McGinn
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 9:456-460
An investigation was made of Pt–Ir silicide films on (100)Si prepared by deposition of submonolayer thickness of Pt followed by 20–30 A of Ir. Submonolayer coverages of Pt induce a crystalline texture approaching an epitaxial relationship between
Autor:
J. H. Thomas, D. J. Szostak
Publikováno v:
Surface and Interface Analysis. 11:312-316
A backscattered electron technique has been used to improve the spacial resolution and elemental sensitivity beyond that obtained from standard Auger microprobe electron spectroscopy. The elastically backscattered electron peak amplitude has been mea
Autor:
D. J. Szostak, B. Goldstein
Publikováno v:
Journal of Applied Physics. 56:522-530
We have used Surface Photovoltage Profiling (SPVP) to study hydrogenated amorphous Si (a‐Si:H) p‐i‐n solar cells grown on glass/conductive‐transparent oxide (CTO) or stainless‐steel substrates. This technique involves the measurement by a K
Publikováno v:
Philosophical Magazine B. 46:63-70
The diffusion length of holes in undoped a-Si : H has been measured by a modified surface-photovoltage method. The a-Si : H was deposited from a d.c. glow discharge in silane. Both field-free and field-assisted hole transport were observed, and could
Publikováno v:
AIP Conference Proceedings.
The diffusion length L for holes in undoped a‐Si:H films has been measured by using a variation of the Surface Photovoltage Method where the sample was illuminated with unmodulated light and the surface photovoltage ΔV was measured with a vibratin
Publikováno v:
Journal of Applied Physics. 48:1007-1008
Improved negative electron affinity (NEA) photoemission sensitivity has been obtained from GaAs reflection photocathodes grown from a stoichiometric (rather than arsenic‐rich) vapor phase on {100} substrates. Sensitivities as high as 2150 μA/lm wi
Publikováno v:
Applied Physics Letters. 38:998-999
The diffusion length L for holes in undoped a‐Si:H films has been measured by using a variation of the surface photovoltage method. Values of L in the range 0.33–0.45 μ were found for samples prepared at substrate temperatures Ts = 240 °C and T