Výsledky vyhledávání - "D. J. Silversmith"

Oxide barriers to the formation of refractory silicides

Autor: D.D. Rathman, D. J. Silversmith, R. W. Mountain

Publikováno v: Thin Solid Films. 93:413-419

An investigation of the formation of refractory metal (tungsten, molybdenum and tantalum) silicides by reaction of the metal with crystalline and polycrystalline silicon at temperatures above 900°C indicates that WSi2 formation can be inhibited by c

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::84b7bea86628be4aa886c18dc8cf018f
https://doi.org/10.1016/0040-6090(82)90147-x

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Raman measurements of stress in silicon‐on‐sapphire device structures

Autor: D. J. Silversmith, B-Y. Tsaur, John C. C. Fan, Steven R. J. Brueck, D. V. Murphy, T. F. Deutsch

Publikováno v: Applied Physics Letters. 40:895-898

Spatially resolved (∼1 μm) Raman scattering measurements of the Si optical phonon spectrum have been used to map the stress in silicon‐on‐sapphire device structures. Devices defined by an isolated island etch technique exhibit a stress relaxat

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e41198f2aa2409a5de8769c38d50faab
https://doi.org/10.1063/1.92939

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Laser microchemical techniques for reversible restructuring of gate-array prototype circuits

Autor: Jan H. C. Sedlacek, D. J. Silversmith, R. W. Mountain, J.Y. Tsao, Daniel J. Ehrlich, W.S. Graber

Publikováno v: IEEE Electron Device Letters. 5:32-35

Laser direct-write Al etching and poly-Si deposition have been adapted to the mask-free alteration of simple gate-array test circuits. Simple test structures on commercial CMOS chips have been reconfigured with no degradation in device or circuit per

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::8aa509fac2ffa067975f184229e66624
https://doi.org/10.1109/edl.1984.25822

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Damage induced in Si by ion milling or reactive ion etching

Autor: R. W. Mountain, P. D. DeGraff, D. J. Silversmith, D. D. Rathman, Stella W. Pang

Publikováno v: Journal of Applied Physics. 54:3272-3277

Surface damage in Si substrates created by Ar‐ion milling or by reactive‐ion etching in CF4, CHF3, Cl2, SiCl4, or SiF4 has been investigated. Metal‐oxide‐semiconductor capacitors were fabricated on the etched Si substrates, and the interface�

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0e683bf1f2b333cf421e9d5797876e3e
https://doi.org/10.1063/1.332437

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Solidification‐Front Modulation to Entrain Subboundaries in Zone‐Melting Recrystallization of Si on SiO2

Autor: R. W. Mountain, Michael W. Geis, Carl V. Thompson, Henry I. Smith, D. J. Silversmith

Publikováno v: Journal of The Electrochemical Society. 130:1178-1183

Presentation de modeles pour la formation et l'entrainement de sous-joints et de joints de grains. L'entrainement des sous-joints demande le controle du gradient de temperature, la modulation des contours isothermes et l'orientation cristallographiqu

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::fff41f6640fce9590ea0bfbca659a1b1
https://doi.org/10.1149/1.2119913

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Zone‐Melting Recrystallization of Si Films with a Moveable‐Strip‐Heater Oven

Autor: Bor-Yeu Tsaur, John C. C. Fan, D. J. Silversmith, Michael W. Geis, Henry I. Smith, R. W. Mountain

Publikováno v: Journal of The Electrochemical Society. 129:2812-2818

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b911a70e8321d43d43f72d5067ead247
https://doi.org/10.1149/1.2123684

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SOI/CMOS circuits fabricated in zone-melting-recrystallized Si films on SiO2-coated Si substrates

Autor: Bor-Yeu Tsaur, Michael W. Geis, R. W. Mountain, John C. C. Fan, R. L. Chapman, D. J. Silversmith

Publikováno v: IEEE Electron Device Letters. 3:398-401

A CMOS test circuit chip containing six arrays of 360 to 533 parallel transistors, two 31-stage ring oscillators, and two inverter chains has been designed for evaluating SOI wafers prepared by using the graphite strip-heater technique for zone-melti

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a4303ab2fe5b530d416f800c4ceccaaf
https://doi.org/10.1109/edl.1982.25613

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Shallow PtSi‐Si Schottky barrier contacts formed by a multilayer metallization technique

Autor: D. J. Silversmith, S. S. Lau, T. T. Sheng, R. W. Mountain, L. S. Hung, B‐Y. Tsaur

Publikováno v: Journal of Applied Physics. 52:5243-5246

Shallow PtSi‐Si Schottky barrier contacts have been formed by heat treatment at 400–500 °C of structures prepared by vacuum deposition of thin alternating Pt and Si layers on n‐type (100) Si substrates. This multilayer technique permits the fo

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f2697496817db87db5a1691d47dc5d92
https://doi.org/10.1063/1.329428

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Effects of subgrain boundaries on carrier transport in zone-melting-recrystallized Si films on SiO2-coated Si substrates

Autor: John C. C. Fan, R. W. Mountain, Bor-Yeu Tsaur, Michael W. Geis, D. J. Silversmith

Publikováno v: IEEE Electron Device Letters. 3:79-82

The transport properties of zone-melting-recrystallized Si films on SiO 2 -coated Si substrates have been studied by the fabrication and characterization of thin-film resistors and n-channel MOSFET's. Subgrain boundaries, which are the predominant cr

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ad8155b62a63c1b0759078fd526c0eb2
https://doi.org/10.1109/edl.1982.25487

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