Zobrazeno 1 - 10
of 17
pro vyhledávání: '"D. Escaich"'
Publikováno v:
Materials Science Forum. 609:49-52
Some investigations on physico-chemical properties of hydrogenated amorphous carbon (a-C:H) thin films deposited from C2H4 precursor have been carried out. The films were elaborated in a Microwave Multipolar Plasma reactor excited at Distributed Elec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c9e18ded63266dcc6b55f378013b7087
https://doi.org/10.4028/www.scientific.net/msf.609.49
https://doi.org/10.4028/www.scientific.net/msf.609.49
Publikováno v:
Surface and Coatings Technology. 201:129-135
Surface wettability of polypropylene (PP) films has been significantly improved by the deposition of thin SiO x layers, elaborated from a mixture of hexamethyldisiloxane (HMDSO) and oxygen in a microwave DECR (distributed electron cyclotron resonance
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9376d86051fc50125a6c2655f7db4b9f
https://doi.org/10.1016/j.surfcoat.2005.11.100
https://doi.org/10.1016/j.surfcoat.2005.11.100
Publikováno v:
Diamond and Related Materials. 15:888-892
The links between plasma parameters, discharge, film structure and properties are not really yet understood for amorphous hydrogenated carbon layers (a-C:H) plasma deposition. Here, a-C:H layers are deposited in a dual radio-frequency–multipolar mi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c57dfac5950621a343723a749f39569c
https://doi.org/10.1016/j.diamond.2005.10.028
https://doi.org/10.1016/j.diamond.2005.10.028
Autor:
Philippe Supiot, Céline Vivien, Patrice Raynaud, Zdenek Stryhal, Angélique Bousquet, Jaroslav Pavlik, D. Escaich, Agnès Granier, Richard Clergereaux, Anna Macková
Publikováno v:
Plasma Processes and Polymers
Plasma Processes and Polymers, Wiley-VCH Verlag, 2006, 3 (2), pp.100-109. ⟨10.1002/ppap.200500154⟩
Plasma Processes and Polymers, Wiley-VCH Verlag, 2006, 3 (2), pp.100-109. ⟨10.1002/ppap.200500154⟩
International audience; Five hundred nanometer thick organosilicon coatings are prepared on Si substrates in parallel by the plasma-assisted polymerisation of hexamethyldisiloxane (HMDSO) in an RF-inductively coupled plasma (RFICP) and distributed el
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fb0e83fe27a33d568a18e98ea0212ea7
https://doi.org/10.1002/ppap.200500154
https://doi.org/10.1002/ppap.200500154
Publikováno v:
Thin Solid Films. 482:216-220
Carbon layers are frequently deposited by plasma-enhanced chemical vapor deposition (PE-CVD). This technology is very promising because of its highly efficient control of film quality, easy integration in current microelectronic technologies, low cos
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4b1236474dcb24509d8d64fefc20fdb2
https://doi.org/10.1016/j.tsf.2004.11.148
https://doi.org/10.1016/j.tsf.2004.11.148
Publikováno v:
MRS Proceedings. 817
Plasma enhanced CVD produces carbon layers with various properties which are highly correlated to the different process parameters such as monomer structure, plasma type or plasma power. For example, the modification of monomer (CH4 to C4H10) or the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dc354139156c93336f2669c81798c0e4
https://doi.org/10.1557/proc-817-l6.23
https://doi.org/10.1557/proc-817-l6.23
Publikováno v:
Applied Physics Letters. 91:181502
Particle formation in cold plasmas is a matter of a large number of studies in capacitive, high-pressure, and low-density discharges. Conversely, under very-low working pressure and high plasma density conditions, as in microwave multipolar plasma ex
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::16ea9b53a1f39743aaec6d640c6de859
https://doi.org/10.1063/1.2804007
https://doi.org/10.1063/1.2804007
Autor:
Céline Vivien, Angélique Bousquet, Jaroslav Pavlik, Agnès Granier, Patrice Raynaud, Zdenek Stryhal, D. Escaich, Richard Clergereaux, Philippe Supiot, Anna Macková
Publikováno v:
Plasma Processes and Polymers. 3:85-85
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a159b70e8cea10b8b7c6ffae3327a296
https://doi.org/10.1002/ppap.200690002
https://doi.org/10.1002/ppap.200690002
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