Zobrazeno 1 - 10
of 32
pro vyhledávání: '"D. E. Hardy"'
Publikováno v:
Journal of Chromatographic Science. 49:1-7
Quantitative analysis of organonitrate explosive standards was performed by gas chromatography (GC) with dual electron capture detection (ECD2) and electron-impact ionization quadrupole mass spectrometry (EI-MS) in selected ion monitoring (SIM) detec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::49eade13a25a9e83b59c55d59ebb81eb
https://doi.org/10.1093/chrsci/49.1.1
https://doi.org/10.1093/chrsci/49.1.1
Autor:
Jonathan M. Oyler, D. E. Hardy, Roderick R. Kunz, Stanley A. Ostazeski, Kerin Clow Gregory, Augustus W. Fountain
Publikováno v:
Analytical and Bioanalytical Chemistry. 395:357-369
A campaign to measure the amount of trace explosive residues in an operational military environment was conducted on May 27-31, 2007, at the National Training Center at Fort Irwin, CA, USA. The objectives of this campaign were to develop the methods
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::adc78c5fc31baa88c593cc91b999d48b
https://doi.org/10.1007/s00216-009-2748-2
https://doi.org/10.1007/s00216-009-2748-2
Autor:
Roderick R. Kunz, D. K. Downs, Theodore M. Bloomstein, D. E. Hardy, Jane E. Curtin, Russell B. Goodman
Publikováno v:
Journal of Photopolymer Science and Technology. 12:561-570
We have measured the transparencies of a number of candidate resist materials for 157nm, with an emphasis on determining which chemical platforms would allow resists to be used at maximum thicknesses while meeting requirements for optical density. As
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::77a3562ab58d482dfff38c800effe67f
https://doi.org/10.2494/photopolymer.12.561
https://doi.org/10.2494/photopolymer.12.561
Publikováno v:
Journal of chromatographic science. 48(4)
Gas chromatography with electron capture detection (GC-ECD) analysis of explosive-related nitro organic compounds was performed using four different column stationary phases with the focus being on their impact on analyte stability and transfer effic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dd66dec5d0cf549b24e169ac1ebd432d
https://pubmed.ncbi.nlm.nih.gov/20412655
https://pubmed.ncbi.nlm.nih.gov/20412655
Publikováno v:
Optics express. 13(2)
A variable -transmittance apodizing filter has been designed and demonstrated at 157 nm. The Gaussian transmission function is created by flowing oxygen gas, which is absorptive below 185 nm, between the two spherical surfaces of meniscus lenses. By
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e1d0b626721e2007ecfa0cccaaa7b87b
https://pubmed.ncbi.nlm.nih.gov/19488395
https://pubmed.ncbi.nlm.nih.gov/19488395
Autor:
D. E. Hardy, Vladimir Liberman, Andrew Grenville, Michael Switkes, Jan H. C. Sedlacek, Stephen T. Palmacci, Mordechai Rothschild
Publikováno v:
Optical Microlithography XVIII.
The final projection lens element in a 193-nm immersion-based lithographic tool will be in direct contact with water during irradiation. Thus, any lifetime considerations for the lens must include durability data of lens materials and thin films in a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b0e2499e34816abf775f6205f85c5b35
https://doi.org/10.1117/12.601468
https://doi.org/10.1117/12.601468
Publikováno v:
Optical Microlithography XVIII.
In liquid immersion lithography the last optical element is in intimate contact with the liquid for extended periods of time, and therefore is at risk of being contaminated by impurities in the liquid. The purity of the liquid must be kept under stri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f69c6bc4611ff1a163c03ae78f81e194
https://doi.org/10.1117/12.601473
https://doi.org/10.1117/12.601473
Autor:
Leonardus H. A. Leunissen, D. E. Hardy, Marylyn Hoy Bennett, Andrew Grenville, Theodore M. Bloomstein, Scott D. Hector, Mordechai Rothschild, James N. Hilfiker, Shane R. Palmer, Vicky Philipsen
Publikováno v:
Optical Microlithography XVIII.
Polarization dependent diffraction efficiencies in transmission through gratings on specially designed masks with pitch comparable to the wavelength were measured using an angle-resolved scatterometry apparatus with a 193 nm excimer source. Four mask
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0e77b9cafa281606deca6cf82007246f
https://doi.org/10.1117/12.600098
https://doi.org/10.1117/12.600098
Autor:
Susan G. Cann, Christopher J. Vineis, J.W. Chludzinski, Mordechai Rothschild, N. N. Efremow, J.C. Twichell, Reuel B. Swint, D. E. Hardy, Douglas C. Oakley, George W. Turner, M. F. Marchant, Paul W. Juodawlkis, A. Napoleone, Theodore M. Bloomstein
Publikováno v:
2005 IEEE LEOS Annual Meeting Conference Proceedings.
InP/InGaAs/InP heterostructures were selectively grown in an array of 60 nm holes on a 90 nm pitch by MOCVD. The pattern was defined photolithographically directly in hydrogen silsesquioxane, a spin-on-glass, obviating the need for pattern transfer p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4db23080976a7a903caa065fb1e11e38
https://doi.org/10.1109/leos.2005.1548307
https://doi.org/10.1109/leos.2005.1548307
Publikováno v:
SPIE Proceedings.
An angle-resolved scattering detection system has been designed and implemented for use at 157 nm. This tool will enable the optimization of polishing and thin-film deposition, whith an eye towards minimizing small-angle scatter in projection lithogr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0c7226035e75672e080c7fdc919086dd
https://doi.org/10.1117/12.485469
https://doi.org/10.1117/12.485469