Formation of inverse cones in crystalline silicon by selective etching of amorphous regions resulting from epitaxial breakdown

Autor: Wanghua Chen, D. Daineka, Erik Johnson, H. Mohsin, P. Roca i Cabarrocas

Publikováno v: Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics, IOP Publishing, 2021, 54 (49), pp.495103. ⟨10.1088/1361-6463/ac22d8⟩

International audience; We report on a process to form micron-scale inverse cones in crystalline silicon without any masking steps using a selective, low temperature (

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ba1f3426bbcb55fcf95efa713a3f16a9
https://hal.archives-ouvertes.fr/hal-03383213

A Contactless Patterned Plasma Processing for Interdigitated Back Contact Silicon Heterojunction Solar Cells Fabrication

Autor: Erik Johnson, Junkang Wang, Fatima Ouadjane, José Alvarez, D. Daineka, Borja Carbonell, Pere Roca i Cabarrocas, Pavel Bulkin, Karim Ouaras, Sergej Filonovich, Monalisa Ghosh

Publikováno v: 2021 IEEE 48th Photovoltaic Specialists Conference (PVSC).

We present results from the application of a novel, contactless patterning technique to form the doped fingers required for interdigitated back contact silicon heterojunction (IBC-SHJ) solar cells. The technique involves patterning the RF powered ele

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::30f3d41482ae5bb24968f37c0e4f4367
https://doi.org/10.1109/pvsc43889.2021.9518831

Area selective deposition of silicon by plasma enhanced chemical vapor deposition using a fluorinated precursor

Autor: Erik Johnson, Daniel Suchet, Sergej Filonovich, Ghewa Akiki, Pavel Bulkin, D. Daineka

Publikováno v: Applied Surface Science
Applied Surface Science, Elsevier, 2020, 531, pp.147305. ⟨10.1016/j.apsusc.2020.147305⟩

International audience; An Area Selective Deposition (ASD) process using Plasma-Enhanced Chemical Vapour Deposition (PECVD) is demonstrated. Using a plasma chemistry containing a fluorinated silicon precursor (SiF 4), no deposition is observed on an

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::887a1c850ba3718b0a640346eea2e4ea
https://hal.archives-ouvertes.fr/hal-03001811

Improvement of near-infrared diffuse reflectance of silver back reflectors through Ag2O formation by a UV-ozone exposure process

Autor: Junkang Wang, Jeongmo Kim, D. Daineka, Erik Johnson

Publikováno v: Solar Energy Materials and Solar Cells. 170:114-119

We report on the fabrication and analysis of highly optically reflective textured stacks consisting of silver oxide (Ag 2 O) coated silver for application as scattering back reflectors in thin-film solar cells. Thin Ag 2 O layers have been formed on

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::d7eca61459e15700747888386f53386a
https://doi.org/10.1016/j.solmat.2017.05.067

Origin of area selective plasma enhanced chemical vapor deposition of microcrystalline silicon

Autor: Mathieu Frégnaux, Muriel Bouttemy, Ghewa Akiki, Sergej Filonovich, Erik Johnson, D. Daineka, Pavel Bulkin, Ileana Florea

Publikováno v: Journal of Vacuum Science and Technology A
Journal of Vacuum Science and Technology A, American Vacuum Society, 2021, 39 (1), pp.013201. ⟨10.1116/6.0000653⟩

International audience; Plasma Enhanced Chemical Vapor Deposition of silicon from SiF4/H2/Ar gas mixture is observed on a SiOxNy surface, while under the same plasma conditions, silicon films do not grow on AlOx nor Al surfaces. Transmission electron

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f70cd24dc0ea60ac237ffb0b2191de6b
https://doi.org/10.1116/6.0000653