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Autor:
D. M. Walker, D. B. Greenstein, M. J. Dalterio, D. C. Bono, K. J. Harte, V. K. Singhal, E. M. Kellogg, G. R. Gibilaro
Publikováno v:
Journal of Vacuum Science and Technology. 19:958-962
A series of experiments to demonstrate the feasibility of the EBAL (electron‐beam array lithography) concept is described, using a system of electron optics that deflects the electron beam in two stages: coarse and fine deflection. The field of vie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::40447aaa49337a66b5b07770eddbb5e2
https://doi.org/10.1116/1.571199
https://doi.org/10.1116/1.571199
