Zobrazeno 1 - 10
of 33
pro vyhledávání: '"D R, Chopra"'
Ayurveda is the medical system which promotes knowledge about the effect of everything existing in the universe with reference existing in the universe with reference to their qualities and pharmacological activities and whether beneficial acticities
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 14:699-703
Zirconium Lα radiation has been utilized to investigate the chemical bonding in silicon compounds by x‐ray photoelectron spectroscopy. The compounds studied in the present investigation are SiO2, SiO, SiC, Si3N4, and silicon‐oxynitrides. The spe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a15d7745a7cbf8acee9f4cc43bfb659b
https://doi.org/10.1116/1.580374
https://doi.org/10.1116/1.580374
Autor:
A. R. Chourasia, D. R. Chopra
Publikováno v:
Surface Science Spectra. 3:74-81
Elemental manganese has been studied by x‐ray photoelectron spectroscopy. Mg Kα and Zr Lα radiations were used as excitation sources for the study. In the literature a range of values has been reported for Mn core levels using Mg radiation. The p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::75b3e92778868ce37736464bf5987e76
https://doi.org/10.1116/1.1247766
https://doi.org/10.1116/1.1247766
Autor:
G. E. McGuire, M. A. Ray, Steven J. Simko, F. Keith. Perkins, Susan L. Brandow, Elizabeth A. Dobisz, R. J. Nemanich, A. R. Chourasia, D. R. Chopra
Publikováno v:
Analytical Chemistry. 65:311-333
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8f7ad45be57f1c04d62dcb31a74c5155
https://doi.org/10.1021/ac00060a016
https://doi.org/10.1021/ac00060a016
Autor:
D. R. Chopra, A. R. Chourasia
Publikováno v:
Surface Science Spectra. 2:117-122
The Si3N4 sample was grown by chemical vapor deposition on a Si substrate at 900 °C using a mixture of SiH4, NH3, and H2 gases. Prior to deposition the Si wafer was cleaned in HCl vapor at about 1050 °C. The formation of Si3N4 was checked by x‐ra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ed7ec63186028f01dbe02612dc0372d
https://doi.org/10.1116/1.1247728
https://doi.org/10.1116/1.1247728
Autor:
J E, Fulghum, G E, McGuire, I H, Musselman, R J, Nemanich, J M, White, D R, Chopra, A R, Chourasia
Publikováno v:
Analytical chemistry. 61(12)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::b3905ab668c19273feac00878cb174de
https://pubmed.ncbi.nlm.nih.gov/20593872
https://pubmed.ncbi.nlm.nih.gov/20593872
Autor:
A. R. Chourasia, D. R. Chopra
Publikováno v:
Surface Science Spectra. 1:233-237
Thin films of TiN were deposited from TiCl4, NH3, and H2 in a lamp heated single wafer ‘‘warm wall’’ low pressure chemical vapor deposition reactor. The deposition was carried out on a TiSi2/Si sample. The thickness of the films is estimated
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6fcf2eaf860ecad5bcf413eeac1b626a
https://doi.org/10.1116/1.1247644
https://doi.org/10.1116/1.1247644
Publikováno v:
Surface Science Spectra. 1:75-79
A thin film of aluminum nitride was deposited on Si(111) by reactive rf magnetron sputtering. The sputtering was carried out from a Al target (99.999%purity) in an Ar and N2 atmosphere. The films are analyzed by x‐ray photoelectron spectroscopy. Th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::33f1e81b5b27d3ba1c4689f494f055d3
https://doi.org/10.1116/1.1247673
https://doi.org/10.1116/1.1247673
Publikováno v:
Analytical Chemistry. 63:99-118
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::18010ebf39784c4aa806f84c91d2c36c
https://doi.org/10.1021/ac00012a007
https://doi.org/10.1021/ac00012a007
Autor:
C. Lin, R. C. Hyer, Suresh C. Sharma, M. Green, Jose M. Perez, A. R. Chourasia, D. R. Chopra, W. Rivera
Publikováno v:
Applied Physics Letters. 62:1889-1891
This article discusses scanning tunneling microscopy of the electronic structure of chemical vapor deposited diamond films.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::31b0e12da3df2c4201f5cd0a211bde23
https://doi.org/10.1063/1.109533
https://doi.org/10.1063/1.109533