Zobrazeno 1 - 10
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pro vyhledávání: '"D Maundrill"'
Publikováno v:
Journal of Physics D: Applied Physics. 20:815-819
An RF-compensated electrostatic probe has been used to investigate RF-generated plasmas. Measurements have been undertaken on N2, N2/CCl4, CCl4 and SF6 plasmas. Calculated values of electron density (Ne) and ion density (Ni) for electronegative gas p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ea2e98602794ceea78808352073577cf
https://doi.org/10.1088/0022-3727/20/7/001
https://doi.org/10.1088/0022-3727/20/7/001
Akademický článek
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Publikováno v:
Journal of Applied Physics; 2/15/1993, Vol. 73 Issue 4, p1634, 10p, 11 Graphs
Autor:
Becker, F., Rangelow, I.W.
Publikováno v:
Journal of Applied Physics; 7/1/1996, Vol. 80 Issue 1, p56, 10p, 3 Diagrams, 14 Graphs
Autor:
Klick, Michael
Publikováno v:
Journal of Applied Physics; 4/1/1996, Vol. 79 Issue 7, p3445, 8p, 1 Diagram, 9 Graphs
In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion
Autor:
Gerhard Franz
In diesem Buch werden zunächst die verschiedenen Typen von Plasmen ausführlich beschrieben: Gleichstrom-Entladung, kapazitive und induktive Kopplung mit Radiofrequenz, die magnetfeldunterstützte Anregung mittels Heliconwellen; schliesslich noch Io
Autor:
Gerhard Franz
Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In t