Zobrazeno 1 - 10
of 12
pro vyhledávání: '"D F Kyser"'
Publikováno v:
Journal of Physics D: Applied Physics. 11:2633-2642
A modified equation is proposed for the X-ray production range of 2-15 keV electrons in solids. The modification is obtained by an experimental procedure which compares the difference in X-ray intensities between pure element thin films and 'bulk' st
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5064795ebc49f3a9d015dffd8d616a83
https://doi.org/10.1088/0022-3727/11/18/021
https://doi.org/10.1088/0022-3727/11/18/021
Autor:
C. H. Ting, D. F. Kyser
Publikováno v:
Journal of Vacuum Science and Technology. 16:1759-1763
Intra line and inter line proximity effects and their dependence on beam voltage are explored via computer simulation of electron scattering, energy deposition, and subsequent development in electron‐beam lithography processes. For thin resist film
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::295347bcda2c9ed71aed4723e9542c30
https://doi.org/10.1116/1.570288
https://doi.org/10.1116/1.570288
Publikováno v:
Journal of Applied Physics. 49:366-375
We have examined the dependence of various properties of sputter‐deposited amorphous GdCo, GdFe, and GdCoX (X=Mo,Cu,Au) films upon substrate bias and annealing. Particular interest was directed to changes in magnetization, anisotropy, composition,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::93376a151b36284dac1783061db9a9cd
https://doi.org/10.1063/1.324344
https://doi.org/10.1063/1.324344
Autor:
D. F. Kyser, R. Pyle
Publikováno v:
IBM Journal of Research and Development. 24:426-437
A user-oriented, conversational computer program, LMS (Lithography Modeling System), has been developed for rapid investigation of the total lithographic process used in electron-beam lithography, including electron exposure und resist development. E
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6a22c7ddcbb4b744eed7a8238fa41e1d
https://doi.org/10.1147/rd.244.0426
https://doi.org/10.1147/rd.244.0426
Autor:
K. Murata, D. F. Kyser
Publikováno v:
IBM Journal of Research and Development. 18:352-363
Monte Carlo simulation procedure is developed for kilovolt electron beam scattering and energy loss in targets consisting of thin films on thick substrates. Such calculations have direct application to the nondestructive quantitative chemical analysi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e88a9edd11295e16ca212b19213c79b0
https://doi.org/10.1147/rd.184.0352
https://doi.org/10.1147/rd.184.0352
Autor:
N. S. Viswanathan, D. F. Kyser
Publikováno v:
Journal of Vacuum Science and Technology. 12:1305-1308
The spatial distribution of energy deposited in a thin polymer film of polymethyl methacrylate (PMMA) by a laterally distributed electron beam is simulated with Monte Carlo calculations. The Monte Carlo simulation includes the significant contributio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::112c9bba8ae2576ed74769a44c095f3d
https://doi.org/10.1116/1.568524
https://doi.org/10.1116/1.568524
Autor:
M. F. Millea, D. F. Kyser
Publikováno v:
Journal of Applied Physics. 36:308-313
Single crystals of GaAs containing Ga{111}, As{111}, and {110} faces decomposed at rates between 4×10−2 and 1×10−3 times the free evaporation rates were examined microscopically. At these high values, the decomposition rate is observed to be or
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f6a6476fa51ade58b0780de77489eddc
https://doi.org/10.1063/1.1713896
https://doi.org/10.1063/1.1713896
Publikováno v:
Journal of Applied Physics. 40:1627-1636
The solution of a Boltzmann equation for electron transport is discussed with emphasis on its application to x‐ray production and electron scattering in electron‐probe microanalysis. Particular attention is given to the assumptions involved in as
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::09ad29f3da95a134e5b9f73a58cac68e
https://doi.org/10.1063/1.1657824
https://doi.org/10.1063/1.1657824
Publikováno v:
SPIE Proceedings.
A practical approach for submicron lithography is mix and match imaging using x-ray and optical steppers. The advantages of x-ray lithography are primarily submicron resolution, unlimited depth of focus and insensitivity to substrate topology and com
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b85a512fea84f24bdcf0e701fb7cba7d
https://doi.org/10.1117/12.940427
https://doi.org/10.1117/12.940427
Publikováno v:
AIP Conference Proceedings.
We present evidence that magnetic uniaxial anisotropy in amorphous RE‐TM films is a more common feature than had been presumed. The incident atomic beam direction appears to define the anisotropy axis in thermally evaporated films while the electri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dda82ee3049a30501ece76ec0e4f99dc
https://doi.org/10.1063/1.30175
https://doi.org/10.1063/1.30175