Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Curt Jackson"'
Autor:
Tiller, Benjamin, Reid, Andrew, Zhu, Botong, Guerreiro, José, Domingo-Roca, Roger, Curt Jackson, Joseph, Windmill, J.F.C.
Publikováno v:
In Materials & Design 5 March 2019 165
Autor:
Benjamin Tiller, Andrew Reid, Botong Zhu, José Guerreiro, Roger Domingo-Roca, Joseph Curt Jackson, J.F.C. Windmill
Publikováno v:
Materials & Design, Vol 165, Iss , Pp - (2019)
In nature sensors possess complex interlocking 3D structures and extremely localized material properties that allow processing of incredibly complex information in a small space. Acoustic sensor design is limited by fabrication processes, often MEMS
Externí odkaz:
https://doaj.org/article/8d2f521f797b4342ac12eb02777ca90b
Publikováno v:
Peace & Change.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9371e07e8f38d2d78f4fb0c0dd028a70
https://doi.org/10.1111/pech.12613
https://doi.org/10.1111/pech.12613
Development of 3D-printed devices, sensors, and actuators has become increasingly popular in recent years due to low cost, rapid production, and device personalization. This personalization process allows the development of devices with unique physic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::56118bcc30d1540665f560196ba90d6f
https://strathprints.strath.ac.uk/62783/1/Domingo_Roca_etal_SAAP_2018_Bio_inspired_3D_printed_piezoelectric_device_for_acoustic.pdf
https://strathprints.strath.ac.uk/62783/1/Domingo_Roca_etal_SAAP_2018_Bio_inspired_3D_printed_piezoelectric_device_for_acoustic.pdf
Publikováno v:
Ethology. 105:503-520
We evaluated the effect of body mass and several environmental factors on vocalization rates of Carolina chickadees (Poecile carolinensis) housed in an aviary. Two different nonsong vocalizations (tseet and chick-a-dee) and song (fee-bee fee-bay) wer
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::15ae078dd13d11bf0889ec12c399b9b5
https://doi.org/10.1046/j.1439-0310.1999.00445.x
https://doi.org/10.1046/j.1439-0310.1999.00445.x
Autor:
Vishal Garg, Jason Hickethier, Cris Morgante, John Manfredo, Peter Buck, Curt Jackson, Paul C. Allen, Michael White, Robert Kiefer
Publikováno v:
SPIE Proceedings.
Currently, the ALTA 4300 generation Deep Ultra-Violet (DUV) Laser tool is capable of printing critical and semi-critical photomasks for the 130nm and 90nm IC technology nodes. With improved optical elements, an improved objective lens, and a higher b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f68b235c169aff6069230a917974dbf6
https://doi.org/10.1117/12.632227
https://doi.org/10.1117/12.632227
Autor:
Curt Jackson, Cris Morgante, Paul C. Allen, John Manfredo, Peter D. Buck, Robert Kiefer, Vishal Garg, David Mellenthin, Jason Hickethier, Michael White, Sarah Cohen, Eric R. Christenson
Publikováno v:
SPIE Proceedings.
Currently, the ALTA 4300 generation DUV Laser tool is capable of printing critical and semi-critical photomasks for the 130nm and 90nm IC technology nodes. With improved optical elements, an improved objective lens, and a higher bandwidth data-path t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::609ac3c9363e404e611eb2ddf625b124
https://doi.org/10.1117/12.617524
https://doi.org/10.1117/12.617524
Autor:
Vishal Garg, Curt Jackson, John Manfredo, David Mellenthin, Cris Morgante, Sarah Cohen, Robert Kiefer, Michael White, Peter D. Buck, Paul C. Allen
Publikováno v:
Optical Microlithography XVIII.
Currently, the ALTA ® 4300 generation DUV Laser system is capable of printing critical and semi-critical photomasks for the 130nm and 90nm IC technology nodes. With improved optical elements, an improved objective lens, and a higher bandwidth datapa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e1a162ef2a28b7cf8be92ba31ac92da5
https://doi.org/10.1117/12.600368
https://doi.org/10.1117/12.600368
Autor:
H. Christopher Hamaker, Robert Kiefer, Michael E. Ungureit, Boaz Kenan, Alan J. Wickstrom, Sam C. Howells, Michael Bohan, Curt Jackson, Eric R. Christenson, Malik K. Sadiq, Peter Pirogovsky, Paul C. Allen, Robin Teitzel, Michael White
Publikováno v:
SPIE Proceedings.
The capability of the DUV ALTAO 4300 system has been extended by the development of two new optical subsystems: a 0.9 NA, 42X reduction lens and a high-bandwidth acousto-optic deflector based beam position and intensity correction servo. The PSM over
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5091775115dc2dd91594577b4fbe8093
https://doi.org/10.1117/12.570291
https://doi.org/10.1117/12.570291
Autor:
John Manfredo, Charles H. Howard, Matt J. Lamantia, James G. Tsou, Jason Hickethier, Robert Kiefer, Vishal Garg, Curt Jackson, Sarah Cohen, Peter D. Buck
Publikováno v:
SPIE Proceedings.
In the recent past Deep Ultra Violet (DUV) Laser generated photomasks have gained widespread acceptance for critical and semi-critical applications in semi-conductor lithography. The advent of stable, highly capable, single-layer Chemically Amplified
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cfdc73bd94cdd4ba5678467768473034
https://doi.org/10.1117/12.557720
https://doi.org/10.1117/12.557720