Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Curt A. Jackson"'
Autor:
Curt A. Jackson, Peter Buck, Sarah Cohen, Vishal Garg, Charles Howard, Robert M. Kiefer, John Manfredo, James Tsou
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::393350dafa9857505b264b3c74401d73
https://doi.org/10.1117/12.534575
https://doi.org/10.1117/12.534575
Publikováno v:
SPIE Proceedings.
We have developed a novel EB lithography simulator, which can analyze pattern profiles and CDs for an unlimited area. The simulator has a parallel Monte Carlo calculation mode with unequal mesh dividing, works on PC cluster hardware, and the new conv
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3cfe9b6f897e1f5fce7eda756f5e6c04
https://doi.org/10.1117/12.468466
https://doi.org/10.1117/12.468466
Autor:
Takeshi Ohfuji, Curt A. Jackson, Shiho Sasaki, Daisuke Totsukawa, Hiroyuki Inomata, Masaaki Kurihara, Naoki Kitano, Naoya Hayashi, Yoshio Murata, David H. Hwang, Naoko Tsugama
Publikováno v:
SPIE Proceedings.
CD uniformity and MTT (Mean to Target) control are very important in mask production for the 90nm node and beyond. Although it is well known that baking temperatures influence CD control in the CAR (chemically amplified resist) process for mask patte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6b44a02b55f10d8d4dc96c726800010f
https://doi.org/10.1117/12.468089
https://doi.org/10.1117/12.468089