Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Cris Morgante"'
Autor:
Vishal Garg, Jason Hickethier, Cris Morgante, John Manfredo, Peter Buck, Curt Jackson, Paul C. Allen, Michael White, Robert Kiefer
Publikováno v:
SPIE Proceedings.
Currently, the ALTA 4300 generation Deep Ultra-Violet (DUV) Laser tool is capable of printing critical and semi-critical photomasks for the 130nm and 90nm IC technology nodes. With improved optical elements, an improved objective lens, and a higher b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f68b235c169aff6069230a917974dbf6
https://doi.org/10.1117/12.632227
https://doi.org/10.1117/12.632227
Autor:
Curt Jackson, Cris Morgante, Paul C. Allen, John Manfredo, Peter D. Buck, Robert Kiefer, Vishal Garg, David Mellenthin, Jason Hickethier, Michael White, Sarah Cohen, Eric R. Christenson
Publikováno v:
SPIE Proceedings.
Currently, the ALTA 4300 generation DUV Laser tool is capable of printing critical and semi-critical photomasks for the 130nm and 90nm IC technology nodes. With improved optical elements, an improved objective lens, and a higher bandwidth data-path t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::609ac3c9363e404e611eb2ddf625b124
https://doi.org/10.1117/12.617524
https://doi.org/10.1117/12.617524
Autor:
Vishal Garg, Curt Jackson, John Manfredo, David Mellenthin, Cris Morgante, Sarah Cohen, Robert Kiefer, Michael White, Peter D. Buck, Paul C. Allen
Publikováno v:
Optical Microlithography XVIII.
Currently, the ALTA ® 4300 generation DUV Laser system is capable of printing critical and semi-critical photomasks for the 130nm and 90nm IC technology nodes. With improved optical elements, an improved objective lens, and a higher bandwidth datapa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e1a162ef2a28b7cf8be92ba31ac92da5
https://doi.org/10.1117/12.600368
https://doi.org/10.1117/12.600368
Autor:
Asher Klatchko, Samuel C. Howells, B. Skyborg, Michael E. Ungureit, Michael White, Thomas E. Chabreck, Robin Teitzel, Peter Pirogovsky, Cris Morgante, John Hubbard, Paul C. Allen, Andrew Berwick
Publikováno v:
SPIE Proceedings.
The ALTA 4300 system has been used to successfully write many advanced designs previously only possible with 50kV VSB systems. In order to further enlarge the application space of this high productivity system, an aerial image enhancement technique h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a644ebb3d9c477ae88903e3deebf46c
https://doi.org/10.1117/12.557806
https://doi.org/10.1117/12.557806