Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Craig Garvin"'
Autor:
Stavros G. Demos, Andy J. Bayramian, Nathaniel D. Urban, Jeff Jarboe, Matthew Murachver, William Clauson, Cote LeBlanc, Kissinger Drew W, Kenneth L. Marshall, Craig Garvin, Selim Elhadj, Jason U. Wallace
Publikováno v:
Laser-Induced Damage in Optical Materials 2021.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::463935e639d810dc1cba9b5b91bb0919
https://doi.org/10.1117/12.2599826
https://doi.org/10.1117/12.2599826
Autor:
Craig Garvin, Jessy W. Grizzle
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 18:1297-1302
The sensitivity of a novel broad frequency band (1–2.25 GHz) radio frequency sensing system to plasma etching process conditions is demonstrated. This is accomplished by using the sensing system to estimate polysilicon etch rate in a Lam 9400 etch
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8d9c71fc4fefcecfb8d8a703092c8c41
https://doi.org/10.1116/1.582343
https://doi.org/10.1116/1.582343
Publikováno v:
Journal of The Electrochemical Society. 145:4247-4252
The energy of ions bombarding the wafer is proportional to the potential difference between the plasma and the powered electrode in reactive ion etching systems. This work seeks to control the ion energy without altering the applied radio-frequency p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9e4a47fe00823ab4d271a769c429a1d1
https://doi.org/10.1149/1.1838945
https://doi.org/10.1149/1.1838945
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 16:595-606
The errors present in electrical measurements at frequencies and impedances relevant to plasma processing in the semiconductor industry are studied. A theoretical bound on calculated delivered power error as a function of measured electrical values i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ab150975ae31cad8b5c02957596f8974
https://doi.org/10.1116/1.581098
https://doi.org/10.1116/1.581098
Publikováno v:
53rd AIAA/ASME/ASCE/AHS/ASC Structures, Structural Dynamics and Materials Conference20th AIAA/ASME/AHS Adaptive Structures Conference14th AIAA.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::99271fc00f7b063d0507e44e14569b77
https://doi.org/10.2514/6.2012-1958
https://doi.org/10.2514/6.2012-1958
Compression Strength After Impact of Unidirectional Fiberglass Rods Consolidated with Aramid Sleeves
Publikováno v:
53rd AIAA/ASME/ASCE/AHS/ASC Structures, Structural Dynamics and Materials Conference20th AIAA/ASME/AHS Adaptive Structures Conference14th AIAA.
Various configurations of aramid sleeves consolidating unidirectional fiberglass composite rods were tested for compression strength after impact. Cylindrical specimens were radially impacted at 5 J (3.7 ft-lbs) or 10 J (7.4 ft-lbs), and compared to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::909c2708bd3f47d2d2aeac30da380f1e
https://doi.org/10.2514/6.2012-1375
https://doi.org/10.2514/6.2012-1375
Publikováno v:
SPIE Proceedings.
This paper evaluates sampling plans for overlay metrology in the context of Advanced Process Control (APC). The relationship between APC opportunity (the maximum benefit achievable via APC) and correctable accuracy is investigated. The tradeoff betwe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::38f816349fa524cd0e74b45d9c8fd75d
https://doi.org/10.1117/12.473528
https://doi.org/10.1117/12.473528
Autor:
Xuemei Chen, Ady Levy, Michael D. Slessor, Georges Falessi, Amir Lev, Matt Hankinson, Kevin M. Monahan, Craig Garvin
Publikováno v:
SPIE Proceedings.
Fundamentally, advanced process control enables accelerated design-rule reduction, but simple microeconomic models that directly link the effects of advanced process control to profitability are rare or non-existent. In this work, we derive these lin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b786a32439adf55fa45114ab1e5a4422
https://doi.org/10.1117/12.473503
https://doi.org/10.1117/12.473503
Autor:
Craig Garvin, Jessy W. Grizzle
Publikováno v:
The 1998 international conference on characterization and metrology for ULSI technology.
ties of the two measurement techniques to detect and isolate plasma changes due to the variation of generator power, chamber pressure, and gas chemistry. In contrast to the ionospheric plasma community's use of only plasma resonance frequency informa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a69f195010e6b14d0c1b7df499adcc52
https://doi.org/10.1063/1.56830
https://doi.org/10.1063/1.56830
Autor:
Pramod P. Khargonekar, Cecilia G. Galarza, Pete Klimecky, Craig Garvin, Fred L. Terry, Brooke S. Stutzman
Publikováno v:
Journal of The Electrochemical Society. 148:C34
We present a methodology termed in situ design of experiments (ISDOE) which enables rapid response surface design in plasma etch chambers while greatly reducing test wafer necessity. We experimentally demonstrate the ISDOE procedure on two separate s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14ad73957e76ef648f9123170e681951
https://doi.org/10.1149/1.1344537
https://doi.org/10.1149/1.1344537