Zobrazeno 1 - 10
of 33
pro vyhledávání: '"Constantinos D. Diakoumakos"'
Publikováno v:
Macromolecular Symposia. 216:37-46
Laprolate-803 (L-803) was used as the model cyclocarbonate resin for reactivity and kinetic studies of non-isocyanate-based solventless polyurethanes derived upon the reaction of amines with the 1,3-dioxolan-2-one (dioxolanone) rings of L-803. It was
Publikováno v:
Polymer. 44:251-260
A novel, low-cost, rapid, accurate, non-invasive and high throughput method based on the principles of Optical Interferometry (OPTI method) has been developed and applied for the in situ monitoring in one simple run of first (melting) and second (gla
Autor:
Evangelos Gogolides, Evangelos Valamontes, Vassilios Constantoudis, Constantinos D. Diakoumakos, Angeliki Tserepi
Publikováno v:
Microelectronic Engineering. :793-801
Different roughness parameters, such as the root mean square deviation (rms or σ), the correlation length Lcor, the fractal dimension D and the Fourier spectrum, are presented and compared. The scaling behavior of σ determining the Lcor as well as
Autor:
Constantinos D. Diakoumakos, Merope Sanopoulou, Ioannis Raptis, Nikos Glezos, Panagiotis Argitis, Margarita Chatzichristidi
Publikováno v:
Microelectronic Engineering. :729-735
The patterning of high aspect ratio structures in ultra thick photoresist films is extremely challenging. Photoresists used should provide low absorption in order to achieve vertical sidewalls and easy stripping after the pattern transfer process. In
Publikováno v:
Microelectronic Engineering. :829-834
To a great extent, the glass transition temperature (T g ) of a photoresist affects its lithographic processing. In the current work, a non-invasive method based on optical interferometry has been developed and applied for the monitoring of T film g
Autor:
Constantinos D. Diakoumakos, Ioannis Raptis, Georgia Terzoudi, Antonios M. Douvas, S.E. Kakabakos, Dimitra Dimotikalli, Panagiotis Argitis
Publikováno v:
Microelectronic Engineering. :819-827
Photoresists developable in dilute aqueous bases are introduced for environmentally friendly photoresist processing and biopatterning. The proposed photoresists are of positive or negative tone, chemically amplified, based on synthesized (meth)acryla
Publikováno v:
Journal of Applied Polymer Science. 84:576-590
A new-synthesized hydroxyl-terminated isophthalate-based liquid oligoester (L-311), an hexakis(methoxymethylol)melamine resin, and various inert pigments (fillers) such as either kaolins (Al2O3 · 2SiO2 · 2H2O) of different particle sizes (1.50 and
Publikováno v:
Polymer. 43:1103-1113
Novel (meth)acrylate tetrapolymers based on 2-hydroxyethyl methacrylate (HEMA) were synthesized via free-radical polymerization in refluxing xylene under monomer-starved conditions for use in negative photoresist formulations. 2,2′-Azobis(2-methylb
Publikováno v:
Surface and Coatings Technology. 150:37-49
Talcs (3MgO.4SiO 2 .H 2 O) of various median particle diameters (2.20, 6.63 and 10.00 μm) were used as inert pigments (fillers) for the preparation of a novel series high-solids (low-VOC content) low-gloss mar resistant pigmented coatings (PN-series
Publikováno v:
Journal of Applied Polymer Science. 83:1317-1333
A new series of high-solids [low-VOC (volatile organic compound)content] mar resistant clearcoats (CL-series) were prepared upon crosslinking of a new-synthesized hydroxyl-terminated isophthalate-based liquid oligoester (L-311) with an hexakis(methox