Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Conny Kenens"'
Autor:
K. Wolke, Wilfried Vandervorst, Conny Kenens, Twan Bearda, Guido Groeseneken, Ingrid Cornelissen, D. M Knotter, Sofie Mertens, Paul W. Mertens, Ivo Teerlinck, Marc Meuris, S. De Gendt, M.M. Heyns, Tanya Nigam, Lee M. Loewenstein, Robin Degraeve, Marc Schaekers, Rita Vos
Publikováno v:
IBM Journal of Research and Development. 43:339-350
Some recent findings in the area of wafer cleaning and thin oxide properties are presented in this paper. Results are shown for a practical implementation of a simplified cleaning concept that combines excellent performance in terms of metal and part
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::66fe93ffe6f24456f9baba27f4cb5962
https://doi.org/10.1147/rd.433.0339
https://doi.org/10.1147/rd.433.0339
Autor:
Kaidong Xu, Wim Fyen, Conny Kenens, Rita Vos, M. Lux, Thierry Conard, Z Hatcher, Paul W. Mertens, Mark Hoffman, Marc Heyns
Publikováno v:
Journal of The Electrochemical Society. 148:G683
We have studied the particle removal efficiency of HF-based cleaning mixtures used to clean wafer surfaces during semiconductor manufacturing. SiO 2 , Si 3 N 4 , and metallic oxide (Al 2 O 3 , TiO 2 ) particles can he easily removed from silicon wafe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a595b92d40b8c4b6f4b8b6701f54e596
https://doi.org/10.1149/1.1413483
https://doi.org/10.1149/1.1413483