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pro vyhledávání: '"Connor J. Leach"'
Ultrathin atomic layer deposited niobium oxide as a passivation layer in silicon based photovoltaics
Publikováno v:
Journal of Applied Physics. 130:215301
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0a75adf10c8bac8ca28bd28ec45aeed8
https://doi.org/10.1063/5.0067281
https://doi.org/10.1063/5.0067281
