Zobrazeno 1 - 10
of 7 201
pro vyhledávání: '"Combustion chemical vapor deposition"'
Publikováno v:
Kirk-Othmer Encyclopedia of Chemical Technology
A thin film is a surface layer with thickness of a few micrometers. These films have properties much different than that of bulk materials or that of the substrate on which the film is deposited. There are a variety of techniques for thin-film deposi
Autor:
B.S.M. Kretzschmar, Andreas Heft, Daniel Göhler, Michael Stintz, Fabian Firmbach, Bernd Grünler, Paul Bergelt, Ronny Köcher
Publikováno v:
Aerosol Science and Technology. 54:1124-1134
For the purpose of silica surface layer modulation, a pneumatic-controlled two-substance atomizer with inertia-based coarse droplet separation was operated at different system pressures for tetraet...
Autor:
Fei Wang, Bai Cui, Catherine Debiemme-Chouvy, K. A. McElveen, Loic Constantin, T. He, Jean-François Silvain, Lisha Fan, X. Li, Xuegang Chen, Yongfeng Lu, Zhipeng Wu, R. Y. Lai
Publikováno v:
Science Advances
Science Advances, American Association for the Advancement of Science (AAAS), 2021, 7 (4), pp.eabc7547. ⟨10.1126/sciadv.abc7547⟩
Science Advances, American Association for the Advancement of Science (AAAS), 2021, 7 (4), pp.eabc7547. ⟨10.1126/sciadv.abc7547⟩
An active, “microscopic,” laser-enabled control of energy coupling channel produces highly conductive and crystalline diamond.
Pursuing high-level doping without deteriorating crystallinity is prohibitively difficult but scientifically cruci
Pursuing high-level doping without deteriorating crystallinity is prohibitively difficult but scientifically cruci
Nowadays, perovskite-structured (e.g., ferrite, cobaltite, and manganite) and other oxide (e.g., titania, zirconia, and yttria) coatings are of great interest in industrial applications such microelectronics, metal corrosion protection, photocatalyti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::37444d4262772a3d143dec73f9975754
https://doi.org/10.1016/b978-0-444-63240-1.00008-5
https://doi.org/10.1016/b978-0-444-63240-1.00008-5
Autor:
Teresa Puig, Xavier Obradors, Albert Calleja, Jordi Sort, Xavier Granados, Valentina Roxana Vlad, Susagna Ricart, Xavier Palmer
Publikováno v:
Recercat. Dipósit de la Recerca de Catalunya
instname
Recercat: Dipósit de la Recerca de Catalunya
Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)
Dipòsit Digital de Documents de la UAB
Universitat Autònoma de Barcelona
instname
Recercat: Dipósit de la Recerca de Catalunya
Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)
Dipòsit Digital de Documents de la UAB
Universitat Autònoma de Barcelona
We report the preparation of a novel type of composites films by chemical solution deposition. It consists of an epitaxial oxide on a single-crystal template inside which an oxide fiber network is dispersed. Electrospinning is used for the deposition
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e53f75be0d089fac8daff9df24df49c3
http://hdl.handle.net/2072/413799
http://hdl.handle.net/2072/413799
Publikováno v:
Chinese Journal of Aeronautics, Vol 31, Iss 4, Pp 820-825 (2018)
Plasma spray-physical vapor deposition (PS-PVD) as a novel coating process based on low-pressure plasma spray (LPPS) has been significantly used for thermal barrier coatings (TBCs). A coating can be deposited from liquid splats, nano-sized clusters,
Publikováno v:
Vacuum. 148:33-40
We used an inline system equipped with a linear plasma enhanced chemical vapor deposition (L-PECVD) source available at low temperatures for the thin film encapsulation of flexible organic light emitting diode displays. This inline system can be used
Publikováno v:
Materials Science in Semiconductor Processing. 74:98-101
Gallium nitride (GaN) films were synthesized by low pressure metalorganic chemical vapor deposition on GaP (100) substrates. Samples were grown using three-step growth method, which includes a) a nitridation process of the GaP surface, b) the growth
Publikováno v:
Thin Solid Films. 645:57-63
We report the epitaxy of n-Ge layer with in situ phosphorus (P)-doping using metal-organic chemical vapor deposition (MOCVD) method with tertiary-butyl-germane and tri-ethyl-phosphine precursors. The crystalline and electrical properties of n-Ge epit
Publikováno v:
Surface and Coatings Technology. 333:195-200
Copper antimony sulfide Cu3SbS3 thin films were successfully deposited on glass substrates using the chemical bath deposition method in aqueous solution containing (CuCl2, 2H2O), SbCl3 and Na2S2O3 as precursors. The structural and optical properties