Výsledky vyhledávání - "Cole Franklin"

Using a Novel Solvent-based Technology to Preserve Low-k Material when Removing Gap Fill Material

Autor: Cole Franklin, Allison C. Rector, Kimberly Dona Pollard, Don Pfettscher, Diane Marie Scheele

Publikováno v: ECS Transactions. 25:117-120

As the technology nodes shrink, device makers are running into barriers with traditional post etch process flows. In the back-end-of-line (BEOL), the porous low-k materials can be damaged by the etch chemistries, the dry ash plasmas and the subsequen

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d1701a58cb10bc71f92f050d87c5e7e1
https://doi.org/10.1149/1.3202643

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Impacts of Ionization Potentials and Megasonic Dispersion

Autor: Cole Franklin

Publikováno v: Solid State Phenomena. :19-22

It has been shown that megasonics can accelerate strip processes such as doped and plasma treated photoresist [1]. However, applied megasonic energy can also damage sensitive semiconductor devices. It was shown that adding a solvent such as IPA or lo

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9f76293e5d6bd15c1e06c586c92ca277
https://doi.org/10.4028/www.scientific.net/ssp.145-146.19

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Using Megasonics to Extend Chemical Cleans for 45nm Technology

Autor: Y. Fan, Cole Franklin, Vu Nguyen, Eric Brause

Publikováno v: ECS Transactions. 11:109-116

Aqueous and solvent chemicals are widely used in the semiconductor industry and as the technology nodes shrink device makers are working to extend these cleaning fluids to the next technology node. Internal data shows megasonic agitation can enhance

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b30784ac5f679dbb61c012a3afb5a129
https://doi.org/10.1149/1.2779369

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Advanced mask cleaning techniques for sub-100-nm technology nodes

Autor: Steven Verhaverbeke, Brian J. Brown, Kent Child, Roman Gouk, Suresh Shrauti, Cole Franklin, Pieter Boelen, James S. Papanu, Elias Martinez, Alexander Sou-Kang Ko, Han-Wen Chen

Publikováno v: SPIE Proceedings.

Sub-pellicle defects and haze increase due to photon reaction with cleaning chemistry residues are especially problematic on photomasks for 193 nm and shorter exposure wavelengths. In addition to mask cleaning, these chemistries are also used for pho

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::cbfe44c016eb7f2a3bf281b662a0b602
https://doi.org/10.1117/12.632294

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Periodical

Progress.

Autor: Agee, William M., Celeste, Richard F., Anderson, William S., Cole, Franklin A., Affleck, James G.

Publikováno v: Harvard Business Review; Jan/Feb1980, Vol. 58 Issue 1, p181-185, 3p

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Analysis of porous plate/water layered structures by means of the transition terms method

Autor: Cole Franklin, Serge Derible, Ferroudja Belhocine

Publikováno v: The Journal of the Acoustical Society of America. 123:3141-3141

This paper is devoted to the study of water‐saturated porous plate/water layered structures by means of the transition terms defined from the reflection and transmission coefficients R and T as follows: TTsym=(1‐(R+T))/(2i) , TTasym=(1‐(R‐T))

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0b1e0e6c277b30d2786044ab94f0434b
https://doi.org/10.1121/1.2933123

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