Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Clyde Browning"'
Publikováno v:
35th European Mask and Lithography Conference (EMLC 2019).
The result of electron beam lithography is influenced by many effects: forward and backward scattering, formation of secondary electrons, re-scattering of electrons, chemicals diffusion in the resist material, wafer stack, etc. To achieve high resolu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef77a5393478275c98db0dac255c0215
https://doi.org/10.1117/12.2534642
https://doi.org/10.1117/12.2534642
Publikováno v:
Proc. SPIE
34th European Mask and Lithography Conference
34th European Mask and Lithography Conference, Jun 2018, Grenoble, France. pp.107750K, ⟨10.1117/12.2326599⟩
34th European Mask and Lithography Conference
34th European Mask and Lithography Conference, Jun 2018, Grenoble, France. pp.107750K, ⟨10.1117/12.2326599⟩
Designs for photonic devices on silicon relies on non-Manhattan features such as curves and a wide variety of angles. Reticle Enhancement Techniques (RET) that are commonly used for CMOS manufacturing now are applied to curvilinear data patterns for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c9c9f5cf80f18ea8cd20919f6dff82c8
https://doi.org/10.1117/12.2326599
https://doi.org/10.1117/12.2326599
Autor:
Clyde Browning, Jerome Hazart, Aurélien Fay, Ludovic Lattard, Jacky Chartoire, Patrick Schavione, Alexandre Chagoya, Pieter Brandt, Mohamed Saib, Sébastien Bérard-Bergery, Sergei Postnikov
Publikováno v:
Proc. SPIE
SPIE Advanced Lithography
SPIE Advanced Lithography, 2016, San Jose, United States. pp.977714, ⟨10.1117/12.2219178⟩
SPIE Advanced Lithography
SPIE Advanced Lithography, 2016, San Jose, United States. pp.977714, ⟨10.1117/12.2219178⟩
Massively parallel mask-less electron beam lithography (MP-EBL) offers a large intrinsic flexibility at a low cost of ownership in comparison to conventional optical lithography tools. This attractive direct-write technique needs a dedicated data pre
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::55c2787ea64254e9c835d3259d5d6db9
https://hal.science/hal-02332442
https://hal.science/hal-02332442
Autor:
Thiago Figueiro, Xaver Thrun, Clyde Browning, Kang-Hoon Choi, Patrick Schiavone, Christoph Hohle, Johann W. Bartha, Mohamed Saib
Publikováno v:
Proc. SPIE
SPIE Photomask Technology
SPIE Photomask Technology, Oct 2015, Monterey, United States. pp.963515, ⟨10.1117/12.2197175⟩
SPIE Photomask Technology
SPIE Photomask Technology, Oct 2015, Monterey, United States. pp.963515, ⟨10.1117/12.2197175⟩
A sensitivity analysis (SA) algorithm was developed and tested to comprehend the influences of different test pattern sets on the calibration of a point spread function (PSF) model with complementary approaches. Variance-based SA is the method of cho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b9b3697c8a2bbdc952084b8091bc0480
https://doi.org/10.1117/12.2197175
https://doi.org/10.1117/12.2197175
Autor:
J. Bustos, Jean-Christophe Marusic, Sébastien Pauliac, Thomas Quaglio, Thiago Figueiro, Aurélien Fay, Clyde Browning, Patrick Schiavone, Jerome Belledent
Publikováno v:
Proc. SPIE
SPIE Photomask Technology
SPIE Photomask Technology, Oct 2014, Monterey, United States. pp.92350V, ⟨10.1117/12.2069335⟩
SPIE Photomask Technology
SPIE Photomask Technology, Oct 2014, Monterey, United States. pp.92350V, ⟨10.1117/12.2069335⟩
With more and more photonic data presence in e-beam lithography, the need for efficient and accurate data fracturing is required to meet acceptable manufacturing cycle time. Large photonic based layouts now create high shot count patterns for VSB bas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c760f529a6f19c9653287476e868e2a0
https://hal.science/hal-02362243
https://hal.science/hal-02362243
Autor:
Thiago Figueiro, Michael Kaiser, Christoph Hohle, Clyde Browning, Kang-Hoon Choi, Patrick Schiavone
Publikováno v:
SPIE Proceedings.
A new correction technique has been developed not only to reduce the corner rounding, but also to restrain the building up of shot counts that is able to increase the exposure time in electron beam (e-beam) lithography. It is able to prove the develo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::51a50db49a60b6d501c19538b2689ab3
https://doi.org/10.1117/12.2066156
https://doi.org/10.1117/12.2066156
Autor:
Christoph Hohle, Thiago Figueiro, Patrick Schiavone, Jean-Hervé Tortai, Kang-Hoon Choi, Cyril Vannuffel, M J Thornton, Clyde Browning
Publikováno v:
Proc. SPIE 8886, 29th European Mask and Lithography Conference
Proc. SPIE 8886, 29th European Mask and Lithography Conference, 2013, pp.88860F. ⟨10.1117/12.2030664⟩
Proc. SPIE 8886, 29th European Mask and Lithography Conference, 2013, pp.88860F. ⟨10.1117/12.2030664⟩
Proximity Effects in electron beam lithography impact feature dimensions, pattern fidelity and uniformity. These effects are addressed using a mathematical model representing the radial exposure intensity distribution induced by a point electron sour
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::651da731d9cedeaaad92e83fd7e5480a
https://doi.org/10.1117/12.2030664
https://doi.org/10.1117/12.2030664
Autor:
Clyde Browning, Russell Cinque, Luc Martin, Patrick Schiavone, Paolo Petroni, Tadashi Komagata, Taiichi Kiuchi, Thomas Quaglio
Publikováno v:
Proc. SPIE
SPIE Photomask Technology
SPIE Photomask Technology, Sep 2013, Monterey, United States. pp.88801F, ⟨10.1117/12.2028944⟩
SPIE Photomask Technology
SPIE Photomask Technology, Sep 2013, Monterey, United States. pp.88801F, ⟨10.1117/12.2028944⟩
VSB mask writers, which create patterns using a combination of rectangles and 45 degree triangles, are ill-suited to non- Manhattan geometries. This issue is particularly acute for layouts which contain a large fraction of curvilinear “offangle”
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2de1c52b886d0de03f4c13acdafe4d9e
https://hal.archives-ouvertes.fr/hal-02362282
https://hal.archives-ouvertes.fr/hal-02362282
Publikováno v:
Alternative Lithographic Technologies V.
Proximity Effects in electron beam lithography impact feature dimensions, pattern fidelity and uniformity. Electron scattering effects are commonly addressed using a mathematical model representing the radial exposure intensity distribution induced b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b8abe2827c66bdcd12087e7bd3c91b8e
https://doi.org/10.1117/12.2011835
https://doi.org/10.1117/12.2011835
Autor:
Vincent Farys, Clyde Browning, Luc Martin, Tadahiko Takikawa, Naoya Hayashi, Patrick Schiavone, Shogo Narukawa, Frank Sundermann
Publikováno v:
SPIE Proceedings.
The new generations of photomasks are seen to bring more and more challenges to the mask manufacturer. Maskshops face two conflicting requirements, namely improving pattern fidelity and reducing or at least maintaining acceptable writing time. These
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::91b78f17fa0009b84787e2ed82230c58
https://doi.org/10.1117/12.981609
https://doi.org/10.1117/12.981609