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Wave plasma brush: Synthesis and Outlooks

Autor: Mazières, V, Pascaud, R, Stafford, L, Bonnet, P, Al Ibrahim, A, Chauvière, C, Liard, L, Dap, S, Clergereaux, R, Pascal, O

Publikováno v: XXXIV General Assembly and Scientific Symposium (GASS) of the International Union of Radio Science (Union Radio Scientifique Internationale-URSI)
XXXIV General Assembly and Scientific Symposium (GASS) of the International Union of Radio Science (Union Radio Scientifique Internationale-URSI), Aug 2021, Rome, Italy

International audience; The aim of this paper is to present the promising outlooks that lies ahead for the innovative plasma source we introduced recently, namely the "wave plasma brush". The idea of this source is to dynamically control the plasma l

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od_______212::936c39bc846f7b96393145081735cd05
https://hal.archives-ouvertes.fr/hal-03373220/document

Investigations on electrical properties of a-C:H thin films deposited in a Microwave Multipolar Plasma reactor excited at Distributed Electron Cyclotron Resonance

Autor: Kihel, M., Clergereaux, R., Escaich, D., Calafat, M., Raynaud, P., Sahli, S., Segui, Y.

Publikováno v: In Diamond & Related Materials 2008 17(7):1710-1715

Plasma deposition of carbon layer: Correlations between plasma parameters, film structure and properties

Autor: Clergereaux, R., Escaich, D., Savin de Larclause, I., Bernecker, B., Raynaud, P.

Publikováno v: In Diamond & Related Materials 2006 15(4):888-892