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Publikováno v:
Optical Microlithography XXXIV.
In this paper, we will present a machine learning solution targeted for memory customers including both assist feature and main feature mask synthesis. In a previous paper, we demonstrated machine learning ILT solutions for the creation of assist fea
Publikováno v:
Optical Microlithography XXXIII.
Since its introduction at Luminescent Technologies and continued development at Synopsys, Inverse Lithography Technology (ILT) has delivered industry leading quality of results (QOR) for mask synthesis designs. With the advent of powerful, widely dep