Zobrazeno 1 - 10
of 37
pro vyhledávání: '"Chunshui Jin"'
Publikováno v:
Journal of Optics. 25:015701
A mapping model of arbitrarily shaped surfaces and the system image quality is constructed to examine the optimization of the residual aberration of an off-axis optical system to construct an off-axis optical system with very small aberrations. First
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::154eb69e2fa9fc2f113d1d6f4f7e5b1d
https://doi.org/10.1088/2040-8986/ac9d4b
https://doi.org/10.1088/2040-8986/ac9d4b
Publikováno v:
Optics Communications. 433:52-59
We present a method for designing error-resistant phase-shifting algorithms to suppress error sources in phase-shifting interferometry. Firstly, the partial-differential processing is applied to the weighted least squares algorithm to obtain error se
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2e82f35a8e0023039ab946e28ad422dd
https://doi.org/10.1016/j.optcom.2018.09.074
https://doi.org/10.1016/j.optcom.2018.09.074
Publikováno v:
Applied optics. 59(32)
This paper proposes a grouping design method based on a combination of spatial ray tracing and aberration correction to construct the initial structure for an off-axis multi-reflective aspheric optical system. This method establishes a mathematical p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::132a46050b2938b050f9fd3ac02dc3e2
https://pubmed.ncbi.nlm.nih.gov/33175796
https://pubmed.ncbi.nlm.nih.gov/33175796
Publikováno v:
Applied Optics. 60:4557
This paper proposes a design method for an off-axis reflective anamorphic optical system (ORAOS). This method first applies vector aberration theory to establish a mathematical model to balance the aberration of an ORAOS. It then builds the error fun
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::93a0045f65d70a61e5e1459a48705be9
https://doi.org/10.1364/ao.427713
https://doi.org/10.1364/ao.427713
Publikováno v:
Surface and Coatings Technology. 395:125691
HfO2 films were fabricated by plasma-ion-assisted deposition of electron beam evaporation (PIAD-EBE) for low absorption applications in UV. The optical, structural and composition properties of the deposited HfO2 films were systematically investigate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::93b185607d0b86691000007dbe6d820e
https://doi.org/10.1016/j.surfcoat.2020.125691
https://doi.org/10.1016/j.surfcoat.2020.125691
Publikováno v:
Optics Express. 28:13516
We performed experiments involving the fabrication of Mo/Si multilayer coatings and established a model of the deposition process. The surface and interface roughness, surface power spectral density, layer structures, and coating reflectivity were ch
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e6dc56af102f5487b054f5241883def7
https://doi.org/10.1364/oe.390216
https://doi.org/10.1364/oe.390216
Publikováno v:
Chinese Journal of Engineering Science. 22:29
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::404c4bbe496305f7fb342ca58518d399
https://doi.org/10.15302/j-sscae-2020.03.005
https://doi.org/10.15302/j-sscae-2020.03.005
Publikováno v:
Optical Engineering. 58:1
Extreme ultraviolet lithography (EUVL) is recognized as a leading technology in next-generation lithography. Achieving spectral purification while ensuring extreme ultraviolet (EUV) reflectance is one of the key technologies for industrializing EUVL.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::63ce924733dda504d064031116592a24
https://doi.org/10.1117/1.oe.58.10.107102
https://doi.org/10.1117/1.oe.58.10.107102
Publikováno v:
SPIE Proceedings.
To meet the requirements of wavelength matching and figure preservation for EUV multilayer optics, study of precise control of the lateral thickness gradients of multilayer was performed. The distribution of the magnetron sputtering source was derive
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1db1a979814ac05017a8d7a9ff44d06b
https://doi.org/10.1117/12.2246160
https://doi.org/10.1117/12.2246160
Publikováno v:
SPIE Proceedings.
Phase-shifting Point Diffraction Interferometer (PSPDI) utilizing nearly perfect spherical wavefront diffracted by a pinhole as reference wavefront, which diminishes the influence of reference optics used in traditional interferometers, has been deve
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df4ccd60c284aa23fbd7045c3ef4999b
https://doi.org/10.1117/12.2246269
https://doi.org/10.1117/12.2246269